Multilayer monochromators for EUV and X-ray optics and the interface characterization
Monochromateurs multicouche pour les domaines des rayons X et de l’extrême ultra-violet et la caractérisation de leurs interfaces
Résumé
Multilayers monochromators nowadays play an important role for optical applications from the extreme ultraviolet (EUV) to x-ray ranges. In this work, interface engineering methods are applied to several multilayer systems，such as Co/Mg, Co/Ti, Cr/Ti, Co/C, Cr/C and Mo/B4C. The interdiffusion and reaction at the interface can be minimized by preparing compound multilayers instead of elemental multilayers. These multilayers are studied by combining fluorescence induced by x-ray standing wave, nuclear magnetic resonance spectroscopy, x-ray reflectometry, transmission electron microscopy and x-ray photoelectron spectroscopy to investigate their interface properties. The results show that the interface quality and optical performance are improved significantly by interface engineering methods. This work aims not only at fabricating multilayer elements with excellent properties for the development of sources and applications in the EUV and soft x-ray ranges, but also at developing a methodology combining simulations and experiments devoted to the interface analysis in these nano-scale multilayer structures.