Abstract : This work concerns the in situ elaboration, by catalytic CVD, of carbon nanotubes and filaments films for their integration as electron emissive films into field emission displays.
The key parameters, advantages and restrictions of several techniques for catalyst nano particles preparation and integration were first analysed : dewetting of a continuous layer, post-dewetting wet etching, nano cluster deposition and e-beam lithography. Three growth techniques were then studied in the same reactor : simple thermal CVD, CVD with an electrical field and plasma assisted CVD from a solid carbon source. Finally, the emissive properties of the elaborated carbonaceous films were measured, in diode mode for the full sheet type samples and in triode mode for the films integrated into display cathodic structures.
Theses results analysis permitted to clarify the links between technological elaboration parameters, morphology and emissive performances of carbon nanotubes and filaments films.