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Couches de Nanotubes et Filaments de Carbone pour l'Emission Froide d'Electrons -
Intégration aux Ecrans Plats à Emission de Champ

Abstract : This work concerns the in situ elaboration, by catalytic CVD, of carbon nanotubes and filaments films for their integration as electron emissive films into field emission displays.
The key parameters, advantages and restrictions of several techniques for catalyst nano particles preparation and integration were first analysed : dewetting of a continuous layer, post-dewetting wet etching, nano cluster deposition and e-beam lithography. Three growth techniques were then studied in the same reactor : simple thermal CVD, CVD with an electrical field and plasma assisted CVD from a solid carbon source. Finally, the emissive properties of the elaborated carbonaceous films were measured, in diode mode for the full sheet type samples and in triode mode for the films integrated into display cathodic structures.
Theses results analysis permitted to clarify the links between technological elaboration parameters, morphology and emissive performances of carbon nanotubes and filaments films.
Complete list of metadatas

https://tel.archives-ouvertes.fr/tel-00090016
Contributor : Thomas Goislard de Monsabert <>
Submitted on : Friday, January 12, 2007 - 2:24:33 PM
Last modification on : Thursday, June 11, 2020 - 5:04:04 PM
Long-term archiving on: : Tuesday, September 21, 2010 - 12:01:09 PM

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  • HAL Id : tel-00090016, version 2

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Citation

Thomas Goislard de Monsabert. Couches de Nanotubes et Filaments de Carbone pour l'Emission Froide d'Electrons -
Intégration aux Ecrans Plats à Emission de Champ. Matériaux. Université Joseph-Fourier - Grenoble I, 2006. Français. ⟨tel-00090016v2⟩

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