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Development of 3D high-resolution imaging of complex devices by the correlation of ToF-SIMS and AFM

Abstract : The continuous miniaturization and complexity of devices have pushed existing nano-characterization techniques to their limits. The correlation of techniques has then become an attractive solution to keep providing precise and accurate characterization. With the aim of overcoming the existing barriers for the 3D high-resolution imaging at the nanoscale, we have focused our research on creating a protocol to combine time-of-flight secondary ion mass spectrometry (ToF-SIMS) with atomic force microscopy (AFM). This combination permits the correlation of the composition in 3-dimensions with the maps of topography and other local properties provided by the AFM. Three main results are achieved through this methodology: a topography-corrected 3D ToF-SIMS data set, maps of local sputter rate where the effect of roughness and vertical interfaces are seen and overlays of the ToF-SIMS and AFM advanced information. The application fields of the ToF-SIMS and AFM combined methodology can be larger than expected. Indeed, four different applications are discussed in this thesis. The procedure to obtain the topography-corrected 3D data sets was applied on a GaAs / SiO2 patterned structure whose initial topography and composition with materials of different sputter rates create a distortion in the classical 3D chemical visualization. The protocol to generate sputter rate maps was used on samples with structured and non-structured nano-areas in order to study the possible ToF-SIMS sputtering artefacts, especially the geometric shadowing effect. Finally, we have explored the combination of ToF-SIMS analysis with three AFM advanced modes: piezoresponse force microcopy (PFM), scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM). Specifically, two main applications were studied: the chemical modification during electrical stress of a piezoelectic thin film and the recovery of initial electrical characteristics of a sample subjected to Ga implantation during FIB preparation. Technical aspects of the methodology will be discussed for each application and the perspectives of this combination will be given.
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Submitted on : Friday, July 17, 2020 - 6:05:27 PM
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  • HAL Id : tel-02902102, version 1


Maiglid Andreina Moreno Villavicencio. Development of 3D high-resolution imaging of complex devices by the correlation of ToF-SIMS and AFM. Electronics. Université de Lyon, 2019. English. ⟨NNT : 2019LYSEI122⟩. ⟨tel-02902102⟩



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