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Couches mésoporeuses de TiO2 déposés par PECVD à la pression atmosphérique en vue d'applications photovoltaïques

Abstract : An atmospheric pressure chemical vapor deposition process equipped with an axial injection torch was chosen for the TiO2 thin films synthesis. A dynamic deposition mode, i.e. moving the substrate holder in front of the plasma jet, was developed to cover a square centimeter surface. Towards the integration of the titania films as the active layer in DSSCs, a porous columnar structure crystallized under the anatase phase was required. The optical emission spectroscopy analysis of the discharge, without and with titanium precursor, provided information about the huge thermal flux transferred to the substrate by the plasma, thanks to gas temperature from 3000 to 4000 K, at distances between 5 and 15 mm from the nozzle. The atomic relative densities estimation, mainly of nitrogen, oxygen and titanium, combined with the process parameters influence on the film microstructure highlighted several growth mechanisms. From these results, a microstructure diagram was built to predict more easily the morphology and the crystallinity of the TiO2 films deposited on silicon substrates, as a function of microwave power and torch-substrate distance. Optimized conditions were found for the synthesis of thin films matching the DSSC active layer specifications. The process parameters were then adapted to replicate the microstructure on glass/FTO substrates, confirming the microstructure diagram, even though the thin film did not fulfill the requirements. Perovskite solar cells were finally made to investigate the interest of the layers developed on silicon substrates.
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Amélie Perraudeau. Couches mésoporeuses de TiO2 déposés par PECVD à la pression atmosphérique en vue d'applications photovoltaïques. Matériaux. Université de Limoges, 2019. Français. ⟨NNT : 2019LIMO0092⟩. ⟨tel-02468328⟩

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