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Ultra propreté : des microgouttes aux nanoparticules

Abstract : With the evolution of microelectronics and the miniaturization of the various components at the nanoscale, the size of the critical particles to be removed during the manufacturing process has been drastically reduced. Indeed, this critical size is currently of the order of 10 nm. Cleaning processes must therefore be able to remove these particles without surfaces damage. In order to answer this challenge, two methods are studied in this work: the use of a spray and the joint application of a polymer layer and a spray.The spray has been used for many years in the microelectronics field. However, the mechanism of particles detachment by this method is still not assimilated. The purpose of this study is to better understand it. Thus, different parameters will be studied leading to the development of a detachment model, showing new variables related to the cleaning process, contamination (nature and particle size) or the storage conditions of surfaces.For its part, the process by using a combination of polymer layer and spray is in full development, but little information is available today. Nevertheless, early studies have demonstrated its ability to clean surfaces with patterns and its effectiveness regardless of the size of the contamination. In this work, different methods of the polymer layer removal will be compared as well as some physicochemical properties specific to it. The objective is to detect key parameters influencing particle removal and to propose a premise of elucidation of the physical mechanisms involved.
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Submitted on : Friday, January 17, 2020 - 4:31:11 PM
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  • HAL Id : tel-02444196, version 1

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STAR | CNRS | UGA

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Adeline Lallart. Ultra propreté : des microgouttes aux nanoparticules. Science des matériaux [cond-mat.mtrl-sci]. Université Grenoble Alpes, 2019. Français. ⟨NNT : 2019GREAY019⟩. ⟨tel-02444196⟩

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