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Maîtrise de l’interface O-diamant/Al2O3 pour le transistor unipolaire à effet de champ en diamant dopé au bore

Abstract : Nowadays, global warming effect is one of most challenging issue for human being. Most of “traditional energy” sources like thermal power; nuclear power, hydroelectricity power, etc. are dangerous and/or potentially dangerous for nature and human being. Therefore, the "greener energy" is highly desired. The "greener energy" has two folds meaning: on one hand, using renewable energy sources like solar power, wind power or geothermal energy, etc. instead of the traditional energy sources. One another hand, use the electricity more effectively and more efficiency. A recent report has pointed out that the energy loss in US is in fact more than sum of all renewable energy generate in US. Therefore, effectively utilizing electricity and limiting the waste is critical.Unfortunately, losses are the endemic of semiconductor components, the central device of all power conversion system. Silicon (Si), the main material for semiconductor components has reached its physical limit. Wide band-gap semiconductors such as SiC, GaN, Ga2O3 and diamond are promising materials to fabricate the devices low ON-state loss and high OFF-state breakdown voltage. Among them, diamond is an ideal semiconductor for power devices due to its superior physical properties. Recent progresses on diamond technology permits one consider the diamond power devices, e.g. MOSFET.In order to realize a diamond MOSFET by controlled diamond semiconductor, the numbers of issues needed to be overcome is important, especially mastering the diamond/oxide interface. In this context, G. Chicot and A. Marechal (former PhD students in our group) has introduced the O-diamond/Al2O3 MOSCAP test devices and measured the type I band alignment at O-diamond/Al2O3 interface, which is favorable to realize both inversion MOSFET and depletion MOSFET in his PhD these. This PhD project is a continuation of two-mentioned thesis and including two main objects: 1. Fundamental investigations dedicate to understand the electrical characteristic of an O-diamond MOSCAP test device; 2. Realize a unipolar diamond MOSFET by controlling the diamond semiconductor epilayer. The thesis will include three chapters:Chapter 1 discusses the context of power devices as well as the physical properties of diamond and state-of-the-art of diamond devices. We also introduce the working principle of an ideal MOSCAP test device and States-of-the-art of O-diamond MOSCAP test devices.Chapter 2 dedicates for the fundamental understanding O-diamond MOSCAP and include three main parts: Part 1 addresses the methodology issues related to diamond growth, fabrication processing and electrical characterizations. We will construct an empirical electrostatics model for O-diamond MOSCAP. Part 2 discusses the origin of leakage current and capacitance-frequency dependent when O-diamond MOSCAP is biasing in negative direction. We quantify the interface states density at O-diamond/Al2O3 interface by conductance method and the complete electrostatics model for O-diamond/Al2O3 MOSCAP will be constructed. Part 3 discusses the origin of leakage current and the capacitance-frequency dependent when the O-diamond MOS capacitor is biasing in positive direction.Chapter 3 introduces our approach to realize a depletion mode diamond MOSFET. Transistor performance and the important parameters of the transistor will be quantified. The benchmark of the device and the projection towards its improvement will be mentioned.
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Submitted on : Wednesday, December 18, 2019 - 11:05:29 AM
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  • HAL Id : tel-02417437, version 1




Thanh-Toan Pham. Maîtrise de l’interface O-diamant/Al2O3 pour le transistor unipolaire à effet de champ en diamant dopé au bore. Electronics. Université Grenoble Alpes, 2017. English. ⟨NNT : 2017GREAT051⟩. ⟨tel-02417437⟩



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