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, La photolithographie conventionnelle a toujoursété la technique clé pour la structuration en microélectronique. Cependant, en raison des exigences continues de réduction des tailles des circuits intégrés, aujourd'hui inférieuresà 50 nm, la résolution de la photolithographie rencontre certaines limitations physiques. Afin de maintenir la bien connue loi de Moore

, Ces macromolécules, en association avec la photolithographie standard, représentent une approche prometteuse en tant que technique de lithographie alternative avancée en microélectronique. De cette façon, la courseà la réduction des dimensions des circuits intégrés (ICs) peutêtre maintenue. Les BCPs présentant une forte incompatibilité chimique entre leurs blocs présentent une valeu? elevée du paramètre d'interaction de Flory-Huggins ?, La théorie des BCPs prédit alors des périodes caractéristiques qui peuventêtre aussi petites que quelques nanomètres

, PDMS en tant que candidat possible pour développer une lithographie par BCP de nouvelle génération, par rapport au plus courant PS-b-PMMA, dont la résolution est limitéeà environ 20 nm. Les performances lithographiques de masques de PS-b-PDMS sont démontrées sur des substrats de Si et de graphène. Ce dernier matériau, ayant des besoins particuliers de structuration, aété particulièrement approfondi. Afin de faciliter la mise en oeuvre de la lithographie par BCP dans l'industrie, Cette thèse explore le potentiel de l'auto-assemblage du polymèreà haut ? PS-b

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