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, La photolithographie conventionnelle a toujoursété la technique clé pour la structuration en microélectronique. Cependant, en raison des exigences continues de réduction des tailles des circuits intégrés, aujourd'hui inférieuresà 50 nm, la résolution de la photolithographie rencontre certaines limitations physiques. Afin de maintenir la bien connue loi de Moore
, Ces macromolécules, en association avec la photolithographie standard, représentent une approche prometteuse en tant que technique de lithographie alternative avancée en microélectronique. De cette façon, la courseà la réduction des dimensions des circuits intégrés (ICs) peutêtre maintenue. Les BCPs présentant une forte incompatibilité chimique entre leurs blocs présentent une valeu? elevée du paramètre d'interaction de Flory-Huggins ?, La théorie des BCPs prédit alors des périodes caractéristiques qui peuventêtre aussi petites que quelques nanomètres
, PDMS en tant que candidat possible pour développer une lithographie par BCP de nouvelle génération, par rapport au plus courant PS-b-PMMA, dont la résolution est limitéeà environ 20 nm. Les performances lithographiques de masques de PS-b-PDMS sont démontrées sur des substrats de Si et de graphène. Ce dernier matériau, ayant des besoins particuliers de structuration, aété particulièrement approfondi. Afin de faciliter la mise en oeuvre de la lithographie par BCP dans l'industrie, Cette thèse explore le potentiel de l'auto-assemblage du polymèreà haut ? PS-b
sélectifs pour le bloc PS, sur le processus d'auto-assemblage de PS-b-PDMS cylindriques et sphériques, aétéétudiée. Les copolymèresà blocs forment des micelles de PS-b-PDMS en solution avec un diamètre 1, Advanced Functional Materials, vol.26, p.5690, 2016. ,
Sub-10 nm silicon nanopillars fabrication using fast and brushless thermal assembly of PS-b-PDMS diblock copolymer, ACS Applied Materials & Interfaces, vol.8, p.9954, 2016. ,
High throughput sub-10 nm metallic particles organization on templates made by block copolymer self-assembly and nanoimprint, Microelectronic Engineering, vol.141, p.155, 2015. ,
URL : https://hal.archives-ouvertes.fr/hal-01869181
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, A route for industry-compatible International Conference -CSTIC 2016, 2016.
DSA pattern transfer with PS-PMMA and silicon-containing block copolymers, Advanced Etch Technology for Nanopatterning, 2016. ,
Novel Si-containing high-block-copolymer for nanolithography application: PS-b-PDMSB. Micro-and Nano-Engineering conference -MNE, 2016. ,
URL : https://hal.archives-ouvertes.fr/hal-01882738
Graphene structuration by self-assembly of block copolymers, 13th International Conference on Nanosciences & Nanotechnologies -NN16, vol.4, p.6827, 2016. ,
URL : https://hal.archives-ouvertes.fr/hal-01882734
Directed self-assembly process for high-? PS-b-PDMS diblock copolymer compatible with microelectronics environment, MRS 2015 Spring Meeting, 2015. ,
URL : https://hal.archives-ouvertes.fr/hal-01877293
In-situ GISAXS investigation during thermal and solvent annealing of high-block copolymers, MRS 2015 Spring Meeting, 2015. ,
URL : https://hal.archives-ouvertes.fr/hal-01877838
Plasma etching optimization and alignment control of directed self-assembled high-? cylindrical PS-b-PDMS, MRS 2015 Spring Meeting, 2015. ,
High throughput sub-10 nm metallic particles organization on templates made by copolymer self-assembly and nanoimprint. Micro and Nano Engineering conference -MNE, 2014. ,
URL : https://hal.archives-ouvertes.fr/hal-01869181
Integration of high-PS-b-PDMS in industry-type photolithography stacks for high resolution lithography processes. Micro and Nano Engineering conference -MNE, 2014. ,
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Fabrication of high quality graphene nanoribbons on large surfaces by block copolymer lithography, Graphene Conference, 2017. ,
URL : https://hal.archives-ouvertes.fr/hal-01825535
Toward new plasma procedure for efficient cleaning of high quality CVD graphene transferred onto SiO 2 /Si substrate. Graphene conference, 2016. ,
A route for industry-compatible directed self-assembly of high-chi PS-PDMS block copolymers, SPIE Advanced Lithography conference: Alternative Lithographic Technologies, vol.9777, p.97791, 2016. ,
Polystyrene brush optimization for directed self-assembly of high-X PS-b-PDMS diblock copolymer, MRS 2015 Spring Meeting, 2015. ,
URL : https://hal.archives-ouvertes.fr/hal-01877848
, Nanolithography with high-? block copolymers
, Journées Nationales sur les Technologies Emergentes en Micronanofabrication, 2015.