Human-powered wearable computing, Human-powered wearable computing, pp.618-629, 1996. ,
DOI : 10.1147/sj.353.0618
Photovoltaic fiber, Photovoltaic fiber, pp.2799-2802, 2009. ,
DOI : 10.1016/j.tsf.2008.11.057
Flexible solar cells for clothing, Materials Today, vol.9, issue.6, pp.42-50, 2006. ,
DOI : 10.1016/S1369-7021(06)71542-5
Advances In Power Sources For Wireless Sensor Nodes, Proceedings of 1st International Workshop on Body Sensor Networks, 2004. ,
« Design of low-power baseband-processor for RFID tag, International Symposium on Applications and the Internet Workshops, pp.4-63, 2006. ,
Thin-film thermoelectric devices with high room-temperature figures of merit, Nature, vol.78, issue.6856, pp.597-602, 2001. ,
DOI : 10.1038/35098012
A self-powered power management circuit for energy harvested by a piezoelectric cantilever, 2010 Twenty-Fifth Annual IEEE Applied Power Electronics Conference and Exposition (APEC), pp.2154-2160, 2010. ,
DOI : 10.1109/APEC.2010.5433535
A spectral density approach for modelling continuous vertical forces on pedestrian structures due to walking, Canadian Journal of Civil Engineering, vol.31, issue.1, pp.65-77, 2004. ,
DOI : 10.1139/l03-072
Energy scavenging with shoe-mounted piezoelectrics, IEEE Micro, vol.21, issue.3, pp.30-42, 2001. ,
DOI : 10.1109/40.928763
« Récupération d'énergie mécanique par polymères électroactifs pour microsystèmes autonomes communicants, 2008. ,
A Compact, Wireless, Self-Powered Pushbutton Controller, Ubiquitous Computing, vol.2201, pp.299-304, 2001. ,
DOI : 10.1007/3-540-45427-6_25
Enhanced Piezoelectricity and Stretchability in Energy Harvesting Devices Fabricated from Buckled PZT Ribbons, Enhanced Piezoelectricity and Stretchability in Energy Harvesting Devices Fabricated from Buckled PZT Ribbons, pp.1331-1336, 2011. ,
DOI : 10.1021/nl104412b
Development of the smart board using metal core piezoelectric complex fibers, TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664), pp.512-515, 2003. ,
DOI : 10.1109/SENSOR.2003.1215366
PZT thin film deposition on Si wafers and optical fibers prepared by reactive DC pulsed magnetron sputtering from a single metallic target, Surface and Coatings Technology, vol.200, issue.1-4, pp.1-4, 2005. ,
DOI : 10.1016/j.surfcoat.2005.03.014
par pression, de l'électricité polaire dans les cristaux hémièdres à faces inclinées, pp.6-9, 1908. ,
Can a Coupling Coefficient of a Piezoelectric Device be Higher Than Those of Its Active Material?, Journal of Intelligent Material Systems and Structures, vol.8, issue.10, pp.859-867, 1997. ,
DOI : 10.1177/1045389X9700801005
Piezoelectric Properties of Lead Zirconate???Lead Titanate Solid???Solution Ceramics, Journal of Applied Physics, vol.25, issue.6, p.809, 1954. ,
DOI : 10.1063/1.1721741
Piezoelectricity in polyvinylidenefluoride, The Journal of the Acoustical Society of America, vol.70, issue.6, p.1596, 1981. ,
DOI : 10.1121/1.387225
On the Piezoelectric Effect of Bone, Journal of the Physical Society of Japan, vol.12, issue.10, pp.1158-1162, 1957. ,
DOI : 10.1143/JPSJ.12.1158
Piezoelectric Effect in Dentin, Journal of Dental Research, vol.50, issue.2, p.516, 1971. ,
DOI : 10.1177/00220345710500027901
The O???Zn (Oxygen-Zinc) system, Journal of Phase Equilibria, vol.511, issue.Suppl. 2, pp.166-176, 1987. ,
DOI : 10.1007/BF02873202
Wide bandgap semiconductors: fundamental properties and modern photonic and electronic devices, 2007. ,
DOI : 10.1007/978-3-540-47235-3
Dielectric, piezoelectric, and electromechanical coupling constants of zinc oxide crystals, Proceedings of the IEEE, pp.225-226, 1968. ,
DOI : 10.1109/PROC.1968.6246
The effect of biaxial texture on the effective electromechanical constants of polycrystalline barium titanate and lead titanate thin films, Acta Materialia, vol.54, issue.14, pp.3657-3663, 2006. ,
DOI : 10.1016/j.actamat.2006.03.023
Equilibrium piezoelectric potential distribution in a deformed ZnO nanowire, Equilibrium piezoelectric potential distribution in a deformed ZnO nanowire, pp.624-629, 2009. ,
DOI : 10.1007/s12274-009-9063-2
Geometric method for measuring body surface area: A height-weight formula validated in infants, children, and adults, The Journal of Pediatrics, vol.93, issue.1, pp.62-66, 1978. ,
DOI : 10.1016/S0022-3476(78)80601-5
Ducros, « Structural and mechanical properties of a-C:H and Si doped a-C:H thin films grown by LF- PECVD, Surface and Coatings Technology, vol.204, pp.9-10, 2010. ,
Influence of inert gas pressure on deposition rate during pulsed laser deposition, Applied Physics A: Materials Science & Processing, pp.551-554, 2002. ,
DOI : 10.1007/s00339-002-1442-4
Energetic deposition using filtered cathodic arc plasmas, Vacuum, vol.67, issue.3-4, pp.673-686, 2002. ,
DOI : 10.1016/S0042-207X(02)00260-9
Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel, Surface and Coatings Technology, vol.200, issue.22-23, pp.22-23, 2006. ,
DOI : 10.1016/j.surfcoat.2005.11.082
Helmersson, et I. Petrov, « A novel pulsed magnetron sputter technique utilizing very high target power densities, Surface and Coatings Technology, vol.122, pp.2-3, 1999. ,
CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology, Surface and Coatings Technology, vol.203, issue.9, pp.1237-1243, 2009. ,
DOI : 10.1016/j.surfcoat.2008.10.033
Kelvin, Ion Viscous Heating in a Magnetohydrodynamically Unstable Z Pinch at Over 2 x 10^{9} Kelvin, p.75003, 2006. ,
DOI : 10.1103/PhysRevLett.96.075003
GeV electron beams from a centimetre-scale accelerator, GeV electron beams from a centimetre-scale accelerator, pp.696-699, 2006. ,
DOI : 10.1103/PhysRevLett.91.074802
Physical Characteristics of Plasma Antennas, IEEE Transactions on Plasma Science, vol.32, issue.1, pp.269-281, 2004. ,
DOI : 10.1109/TPS.2004.826019
Study and Optimization of Plasma-Based Radar Cross Section Reduction Using Three-Dimensional Computations, IEEE Transactions on Plasma Science, vol.37, issue.11, pp.2116-2127, 2009. ,
DOI : 10.1109/TPS.2009.2032331
Time-correlated force production measurements of the dielectric barrier discharge plasma aerodynamic actuator, Journal of Applied Physics, vol.103, issue.7, p.73302, 2008. ,
DOI : 10.1063/1.2896590
Plasma flow and plasma???wall transition in Hall thruster channel, Physics of Plasmas, vol.8, issue.12, p.5315, 2001. ,
DOI : 10.1063/1.1421370
Electro-optical switches with plasma electrodes, Optics Letters, vol.9, issue.3, pp.73-75, 1984. ,
DOI : 10.1364/OL.9.000073
« Method and apparatus for charged particle propagation, 1996. ,
On the Electro-Chemical Polarity of Gases, On the Electro-Chemical Polarity of Gases, pp.87-101 ,
DOI : 10.1098/rstl.1852.0008
Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets, Physical Review, vol.184, issue.2, pp.383-416, 1969. ,
DOI : 10.1103/PhysRev.184.383
Relation between the flux of energetic oxygen ions and the sputtered metal atoms in oxide film deposition by reactive sputtering, Vacuum, vol.59, issue.2-3, pp.574-580, 2000. ,
DOI : 10.1016/S0042-207X(00)00318-3
The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering, Vacuum, vol.82, issue.8, pp.867-870, 2008. ,
DOI : 10.1016/j.vacuum.2007.10.011
Discharge physics of high power impulse magnetron sputtering, Surface and Coatings Technology, vol.205, issue.2, pp.1-9, 2011. ,
DOI : 10.1016/j.surfcoat.2011.03.081
Deposition of PTFE thin films by RF plasma sputtering on ???100??? silicon substrates, Applied Surface Science, vol.245, issue.1-4, pp.1-4, 2005. ,
DOI : 10.1016/j.apsusc.2004.10.023
Reactive alternating current magnetron sputtering of dielectric layers, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.10, issue.4, pp.1772-1776, 1992. ,
DOI : 10.1116/1.577745
On the electron energy in the high power impulse magnetron sputtering discharge, Journal of Applied Physics, vol.105, issue.12, pp.123302-123302, 2009. ,
DOI : 10.1063/1.3151953
Ion acceleration and cooling in gasless self-sputtering, Applied Physics Letters, vol.97, issue.22, p.221501, 2010. ,
DOI : 10.1063/1.3521264
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges, Journal of Applied Physics, vol.99, issue.1, p.13307, 2006. ,
DOI : 10.1063/1.2159555
Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma, Applied Physics Letters, vol.93, issue.7, p.71504, 2008. ,
DOI : 10.1063/1.2973179
On the anisotropy and thermalization of the metal sputtered atoms in a low-pressure magnetron discharge, EPL (Europhysics Letters), vol.82, issue.1, 2008. ,
DOI : 10.1209/0295-5075/82/15002
Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time- and space-resolved optical emission spectroscopy and fast imaging, Journal of Applied Physics, vol.107, issue.4, pp.43305-043305, 2010. ,
DOI : 10.1063/1.3305319.3
Compression and strong rarefaction in high power impulse magnetron sputtering discharges, Journal of Applied Physics, vol.108, issue.12, p.123306, 2010. ,
DOI : 10.1063/1.3525986
Plasma dynamics in a highly ionized pulsed magnetron discharge, Plasma Sources Science and Technology, vol.14, issue.3, pp.525-531, 2005. ,
DOI : 10.1088/0963-0252/14/3/015
Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion, Applied Physics Letters, vol.92, issue.22, p.221503, 2008. ,
DOI : 10.1063/1.2938414
Sustained self???sputtering using a direct current magnetron source, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.11, issue.6, pp.2980-2984, 1993. ,
DOI : 10.1116/1.578679
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering, Journal of Applied Physics, vol.102, issue.11, p.113303, 2007. ,
DOI : 10.1063/1.2817812
Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions, Applied Physics Letters, vol.92, issue.20, pp.201501-201501, 2008. ,
DOI : 10.1063/1.2936307
Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering, Journal of Applied Physics, vol.111, issue.5, pp.53304-053304, 2012. ,
DOI : 10.1063/1.3692978
Correlation between electron and negative O??? ion emission during reactive sputtering of oxides, Applied Physics Letters, vol.90, issue.12, 2007. ,
DOI : 10.1063/1.2715113
Energetic oxygen particles in the reactive sputtering of Zn targets in Ar/O2 atmospheres, Thin Solid Films, vol.343, issue.344, pp.81-84, 1999. ,
DOI : 10.1016/S0040-6090(98)01579-X
Determination of the effective electron emission yields of compound materials, Journal of Physics D: Applied Physics, vol.41, issue.20, p.202003, 2008. ,
DOI : 10.1088/0022-3727/41/20/202003
The secondary electron emission yield for 24 solid elements excited by primary electrons in the range 250-5000???ev: a theory/experiment comparison, Scanning, vol.99, issue.2, pp.365-380, 2008. ,
DOI : 10.1002/sca.20124
Low-field electron emission from tetrapod-like ZnO nanostructures synthesized by rapid evaporation, Applied Physics Letters, vol.83, issue.11, p.2253, 2003. ,
DOI : 10.1063/1.1612899
Hysteresis-free reactive high power impulse magnetron sputtering, Thin Solid Films, vol.516, issue.18, pp.6398-6401, 2008. ,
DOI : 10.1016/j.tsf.2007.08.123
Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides, Thin Solid Films, vol.519, issue.22, pp.7779-7784, 2011. ,
DOI : 10.1016/j.tsf.2011.06.021
Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide, Surface and Coatings Technology, vol.202, issue.20, pp.5033-5035, 2008. ,
DOI : 10.1016/j.surfcoat.2008.05.009
Hysteresis behaviour of reactive high power impulse magnetron sputtering, Thin Solid Films, vol.518, issue.8, pp.1962-1965, 2010. ,
DOI : 10.1016/j.tsf.2009.12.011
high power impulse magnetron sputtering discharge, Journal of Applied Physics, vol.110, issue.8, p.83306, 2011. ,
DOI : 10.1063/1.3653233
Helmersson, « Studies of hysteresis effect in reactive HiPIMS deposition of oxides, Surface and Coatings Technology PSE 2010 Special Issue, vol.205, pp.303-306, 2011. ,
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art, Surface and Coatings Technology, vol.204, issue.11, pp.1661-1684, 2010. ,
DOI : 10.1016/j.surfcoat.2009.11.013
Fundamentals of high power pulsed magnetron sputtering: Visualization of mechanisms for rate reduction and increased ion fraction, Czechoslovak Journal of Physics, vol.23, issue.2, pp.93-97, 2006. ,
DOI : 10.1007/s10582-006-0183-6
Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper, Journal of Physics D: Applied Physics, vol.41, issue.13, 2008. ,
DOI : 10.1088/0022-3727/41/13/135210
Deposition rates of high power impulse magnetron sputtering: Physics and economics, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.28, issue.4, p.783, 2010. ,
DOI : 10.1116/1.3299267
A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering, Journal of Physics D: Applied Physics, vol.41, issue.21, p.215301, 2008. ,
DOI : 10.1088/0022-3727/41/21/215301
Crytal Growth For Begginers: Fundamentals of Nucleation, Crystal Growth and Epitaxy, 2 e éd, 2004. ,
Demchishin, « Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminium oxide and zirconium dioxide, PHYS METALS METALLOGR (USSR), vol.28, issue.4, pp.83-90, 1969. ,
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings, Journal of Vacuum Science and Technology, vol.11, issue.4, p.666, 1974. ,
DOI : 10.1116/1.1312732
Biaxial alignment in sputter deposited thin films, Thin Solid Films, vol.515, issue.4, pp.1229-1249, 2006. ,
DOI : 10.1016/j.tsf.2006.06.027
Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate, Journal of Physics D: Applied Physics, vol.42, issue.5, p.53002, 2009. ,
DOI : 10.1088/0022-3727/42/5/053002
A structure zone diagram including plasma-based deposition and ion etching, Thin Solid Films, vol.518, issue.15, pp.4087-4090, 2010. ,
DOI : 10.1016/j.tsf.2009.10.145
Stress and grain growth in thin films, Journal of the Mechanics and Physics of Solids, vol.44, issue.5, pp.657-673, 1996. ,
DOI : 10.1016/0022-5096(96)00022-1
Fundamental structure forming phenomena of polycrystalline films and the structure zone models, Thin Solid Films, vol.317, issue.1-2, pp.1-2, 1998. ,
DOI : 10.1016/S0040-6090(97)00503-8
Columnar growth of ALN by r.f. magnetron sputtering: Role of the {101??3} planes, Journal of Crystal Growth, vol.307, issue.1, pp.245-252, 2007. ,
DOI : 10.1016/j.jcrysgro.2007.06.013
URL : https://hal.archives-ouvertes.fr/hal-00168922
« Microstructure modification of yttria-stabilized zirconia layers prepared by EB-PVD », Nippon seramikkusu kyokai gakujutsu ronbunshi, pp.883-889 ,
Grain-size-dependent thermal conductivity of nanocrystalline yttria-stabilized zirconia films grown by metal-organic chemical vapor deposition, Applied Physics Letters, vol.77, issue.8, pp.1155-1157, 2000. ,
DOI : 10.1063/1.1289803
Stiller, « Influence of aging on structure and thermal conductivity of Y-PSZ and Y-FSZ EB-PVD coatings, Surface and Coatings Technology, pp.177-178, 2004. ,
High-speed oxide coating by laser chemical vapor deposition and their nano-structure, Thin Solid Films, vol.515, issue.1, pp.46-52, 2006. ,
DOI : 10.1016/j.tsf.2005.12.022
Stals, « A quantitative model for the evolution from random orientation to a unique texture in PVD thin film growth, Thin Solid Films, vol.258, pp.1-2, 1995. ,
Preferred orientation and piezoelectricity in sputtered ZnO films, Preferred orientation and piezoelectricity in sputtered ZnO films, p.7844, 1998. ,
DOI : 10.1063/1.367959
Stress and preferred orientation in nitride-based PVD coatings, Surface and Coatings Technology, vol.202, issue.11, pp.2223-2235, 2008. ,
DOI : 10.1016/j.surfcoat.2007.08.029
Effect of electric field upon the ZnO growth on sapphire (0 0 0 1) by atomic layer epitaxy method, Chemical Physics Letters, vol.355, pp.1-2, 2002. ,
« First-Principles Study of the Surface Energy and Atom Cohesion of Wurtzite ZnO and ZnS -Implications for Nanostructure Formation, Journal of the Korean Physical Society, vol.56, issue.12, p.498, 2010. ,
Growth of ZnO thin films???experiment and theory, Growth of ZnO thin films?experiment and theory, pp.139-148, 2004. ,
DOI : 10.1039/B414111C
Growth and Surface Structure of Zinc Oxide Layers on a Pd(111) Surface, Growth and Surface Structure of Zinc Oxide Layers on a Pd(1l1) Surface », pp.15432-15439, 2009. ,
DOI : 10.1021/jp104620n
Microstructural evolution and preferred orientation change of radio???frequency???magnetron sputtered ZnO thin films, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.14, issue.3, pp.1943-1948, 1996. ,
DOI : 10.1116/1.580365
study, Journal of Applied Physics, vol.93, issue.11, pp.9086-9094, 2003. ,
DOI : 10.1063/1.1567797
URL : https://hal.archives-ouvertes.fr/in2p3-00016129
Room-temperature deposition of transparent conducting Al-doped ZnO films by RF magnetron sputtering method, Applied Surface Science, vol.255, issue.11, pp.5669-5673, 2009. ,
DOI : 10.1016/j.apsusc.2008.12.021
Effect of RF power on optical and electrical properties of ZnO thin film by magnetron sputtering, Materials Chemistry and Physics, vol.72, issue.2, pp.269-272, 2001. ,
DOI : 10.1016/S0254-0584(01)00450-3
Effects of annealing on properties of ZnO thin films prepared by electrochemical deposition in chloride medium, Applied Surface Science, vol.256, issue.6, pp.1895-1907, 2010. ,
DOI : 10.1016/j.apsusc.2009.10.032
Deposition of zinc oxide layers by high-power impulse magnetron sputtering, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.25, issue.3, p.19, 2007. ,
DOI : 10.1116/1.2735968
Giant piezoelectric d[sub 33] coefficient in ferroelectric vanadium doped ZnO films, Giant piezoelectric d33 coefficient in ferroelectric vanadium doped ZnO films, pp.12907-012907, 2008. ,
DOI : 10.1063/1.2830663
Thin film analysis by X-ray scattering, 2006. ,
DOI : 10.1002/3527607595
Effect of intrinsic stress on the optical properties of nanostructured ZnO thin films grown by rf magnetron sputtering, Applied Surface Science, vol.254, issue.20, pp.6509-6513, 2008. ,
DOI : 10.1016/j.apsusc.2008.04.012
« An Estimation of the Possibilities of the Cylindrical Magnetron Sputtering Systems for Coating of Wires », Bulg, J. Phys, vol.13, issue.3, pp.273-279, 1986. ,
Improved design of inverted magnetrons used for deposition of thin films on wires, Surface and Coatings Technology, vol.90, issue.3, pp.268-274, 1997. ,
DOI : 10.1016/S0257-8972(96)03151-9
Design, characterisation and operation of an inverted cylindrical magnetron for metal deposition, Plasma Devices and Operations, pp.175-186, 2004. ,
DOI : 10.1116/1.569451
Abukay, « Effect of deposition conditions on YBa2Cu3O7-d thin films by inverted cylindrical magnetron sputtering and substrate effects, Solid State Communications, vol.130, issue.5, pp.357-361, 2004. ,
Reactive deposition of nitrides and oxides using a twin-cathode inverted cylindrical magnetron, Surface and Coatings Technology, vol.133, issue.134, pp.133-134, 2000. ,
DOI : 10.1016/S0257-8972(00)00920-8
Ueber die zum Funken??bergang in Luft, Wasserstoff und Kohlens??ure bei verschiedenen Drucken erforderliche Potentialdifferenz, Annalen der Physik, vol.29, issue.5, pp.69-96 ,
DOI : 10.1002/andp.18892730505
Origin of the Delayed Current Onset in High-Power Impulse Magnetron Sputtering, IEEE Transactions on Plasma Science, vol.38, issue.11, pp.3028-3034, 2010. ,
DOI : 10.1109/TPS.2010.2063041
The Influence of Pulse Frequency and Duty on the Deposition Rate in Pulsed Magnetron Sputtering, Plasma Processes and Polymers, vol.16, issue.175, pp.246-252, 2007. ,
DOI : 10.1002/ppap.200600159
Influence of the oxygen partial pressure and post-deposition annealing on the structure and optical properties of ZnO films grown by dc magnetron sputtering at room temperature, Journal of Physics D: Applied Physics, vol.45, issue.2, p.25303, 2012. ,
DOI : 10.1088/0022-3727/45/2/025303
Hydrothermally grown oriented ZnO nanorod arrays for gas sensing applications, Nanotechnology, vol.17, issue.19, pp.4995-4998, 2006. ,
DOI : 10.1088/0957-4484/17/19/037
Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge, Journal of Physics D: Applied Physics, vol.41, issue.9, p.95203, 2008. ,
DOI : 10.1088/0022-3727/41/9/095203
Solidification and Crystallization Processing in Metals and Alloys, 2012. ,
DOI : 10.1002/9781119975540
Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates, Vacuum, vol.59, issue.2-3, pp.2-3, 2000. ,
DOI : 10.1016/S0042-207X(00)00294-3
Simulated plasma immersion ion implantation processing of thin wires, Journal of Applied Physics, vol.108, issue.6, p.63308, 2010. ,
DOI : 10.1063/1.3485812
Thickness dependence of the nanoscale piezoelectric properties measured by piezoresponse force microscopy on (111)-oriented PLZT 10/40/60 thin films, Surface Science, vol.602, issue.11, pp.1987-1992, 2008. ,
DOI : 10.1016/j.susc.2008.04.001
Skorobogatiy, « Soft capacitor fibers using conductive polymers for electronic textiles, Smart Materials and Structures, p.115006, 2010. ,