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Evaluation de Réticules Avancés : Propriétés optiques des réticules et prise en compte de leur processus de fabrication dans l’amélioration des modèles OPC pour étendre les fenêtres de procédés en lithographie optique par immersion, pour les noeuds technologiques 28nm et 14nm

Abstract : For advanced technologies nodes, immersion optical lithography using 193nm sources reaches its limits in terms of resolutions. Since new lithography techniques such as Extreme UV or multi-beam writing are not yet ready from an industrial point of view, a continuous evolving set of tools known as Resolution Enhancement Technics (RET) allows to continue working with immersion equipment, pushing the resolution limits as much as possible. With the increasing design complexity, this task is more and more challenging. Within this frame this dissertation is addressed to improve the lithographic process variability by focusing on one of the main elements: the reticles.The first part brings together the state of the art of optical photolithography and resolution improvement techniques, as well as a set of concepts useful for parts B and C understanding. Part B deals with the reduction of focusing effects, better known as "Best focus shift mitigation", observed on dense levels such as "Metal" for advanced technologies. This part helps to understand the influence of the physical organs on the optical path and proposes as a solution to the Best focus Shift a reticle change, firstly validated via simulation and then experimentally at wafer level. Part C presents how the inherent effects of reticle fabrication can be taken into account in the Optical Proximity effects Corrections steps, from the description of the effects involved to the calibration and the use of a dedicated mask model
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https://tel.archives-ouvertes.fr/tel-01748516
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Submitted on : Thursday, March 29, 2018 - 11:37:07 AM
Last modification on : Wednesday, October 14, 2020 - 4:18:32 AM
Long-term archiving on: : Friday, September 14, 2018 - 2:59:32 AM

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Nacer Zine El Abidine. Evaluation de Réticules Avancés : Propriétés optiques des réticules et prise en compte de leur processus de fabrication dans l’amélioration des modèles OPC pour étendre les fenêtres de procédés en lithographie optique par immersion, pour les noeuds technologiques 28nm et 14nm. Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes, 2017. Français. ⟨NNT : 2017GREAT079⟩. ⟨tel-01748516⟩

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