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Nanometre-thick alumina coatings deposited by ALD on metals : a comparative electrochemical and surface analysis study of corrosion properties

Abstract : Corrosion protection by ultrathin (≤ 50 nm) alumina films deposited by atomic layer deposition (ALD) on copper and aluminium at 250°C was studied in 0.5 M NaCl aqueous solution by combining electrochemical and surface analytical methods. The study of ALD Al2O3 on Cu substrate included investigation of the effect of the coating thickness, the effect of an interfacial oxide, the effect of surface preparation and the durability of the coating. For ALD Al2O3 on Al substrate, the work focused on the examination of the effect of the deposited coating thickness. ALD alumina coatings showed excellent corrosion properties on electropolished copper substrates, while they failed to protect the annealed substrate, as a result of poor adhesion to a smoothened surface. Modification of interfacial native copper oxide by its pre-treatment led to better corrosion protection of ALD alumina on copper substrate. Despite its remarkable sealing properties on electropolished Cu substrate, corrosion protection of ALD alumina was not durable. Coating of Al substrate with ALD Al2O3 led to significant increase of polarization resistance. Better performance was obtained for 10 and 20 nm coatings on Al than on Cu. Apart from significant decrease of current, the pitting potential was increased in presence of 20 and 50 nm coatings, which was not achieved with 10 nm due to its low thickness. This study was a preliminary study for application of ALD alumina coatings for corrosion protection of Al-Cu alloys in combination with other ALD compositions.
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Shadi Mirhashemihaghighi. Nanometre-thick alumina coatings deposited by ALD on metals : a comparative electrochemical and surface analysis study of corrosion properties. Chemical Physics [physics.chem-ph]. Université Pierre et Marie Curie - Paris VI, 2015. English. ⟨NNT : 2015PA066349⟩. ⟨tel-01265540⟩

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