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Simulations of plasma sputtering deposition and thin film growth

Abstract : The objective of this thesis is to study the deposition of thin films by plasma sputtering using moleculardynamics simulations, focusing on the mechanisms of formation of the microstructure in various deposition conditions relevant to experiments. Deposition of thin films AlCoCrCuFeNi and ZrxCu100-x on Si (100) by magnetron sputtering process of co-sputtering have been studied by molecular dynamics simulations using similar experiments to those initial conditions. The results show that the phase ZrxCu100-x thin films is determined by the composition of the binary alloy and the average kinetic energy of the incident atoms. The simulated AlCoCrCuFeNi alloys have fcc / bcc structure modulated by the composition in accordance with experience. They have a tendency to evolve into a solid solution of bulk metallic glasses found. Plasma deposition of platinum atoms spray on two nanostructured carbon substrates (porous carbon and carbon nanotubes) has also been studied at room temperature (300K) and two sets of parameters of Lennard-Jones potential and three distributions of different kinetic energy Pt atoms incident on the substrate. The simulation results are in good agreement with the experimental results. Finally, the numerical simulation of magnetron discharges was introduced to determine the input parameters for the MD simulations. The charged particles are described by the hydrodynamic model, expressions using conventional flow. The characteristics of the reactor are reproduced by the first simulations.
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Lu Xie. Simulations of plasma sputtering deposition and thin film growth. Other [cond-mat.other]. Université d'Orléans, 2013. English. ⟨NNT : 2013ORLE2024⟩. ⟨tel-00933201⟩

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