Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties, Thin Solid Films, vol.516, issue.14, pp.4487-4496, 2008. ,
DOI : 10.1016/j.tsf.2007.05.097
Thin Films by Atomic Layer Deposition, Chemistry of Materials, vol.11, issue.7, pp.1712-1753, 1999. ,
DOI : 10.1021/cm980760x
Hand book of X-ray photoelectron spectroscopy, Edité par J. Chastain. Publié par Perkin-Elmer corporation, p.90, 1992. ,
The impact of substrate properties and thermal annealing on tantalum nitride thin films, Applied Surface Science, vol.258, issue.7, pp.2894-99, 2012. ,
DOI : 10.1016/j.apsusc.2011.11.003
Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method, Journal of Alloys and Compounds, vol.475, issue.1-2, p.488, 2009. ,
DOI : 10.1016/j.jallcom.2008.07.126
The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids, Physical Review, vol.92, issue.5, p.1324, 1953. ,
DOI : 10.1103/PhysRev.92.1324
Determination of the thickness and optical constants of amorphous silicon, Journal of Physics E: Scientific Instruments, vol.16, issue.12, p.1214, 1983. ,
DOI : 10.1088/0022-3735/16/12/023
Structures and photocatalytic behavior of tantalum-oxynitride thin films, Thin Solid Films, vol.519, issue.15, p.4699, 2011. ,
DOI : 10.1016/j.tsf.2011.01.018
spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition, Journal of Physics D: Applied Physics, vol.42, issue.7, p.73001, 2009. ,
DOI : 10.1088/0022-3727/42/7/073001
New Non-Oxide Photocatalysts Designed for Overall Water Splitting under Visible Light, The Journal of Physical Chemistry C, vol.111, issue.22, p.7851, 2007. ,
DOI : 10.1021/jp070911w
Spectroscopic ellipsometry of very thin tantalum pentoxide on Si, Applied Surface Science, vol.255, issue.22, p.9211, 2009. ,
DOI : 10.1016/j.apsusc.2009.07.014
Variation in the fixed charge density of SiO[sub x]/ZrO[sub 2] gate dielectric stacks during postdeposition oxidation, Applied Physics Letters, vol.77, issue.12, p.1885, 2000. ,
DOI : 10.1063/1.1310635
Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films, Chemistry of Materials, vol.5, issue.5, p.614, 1993. ,
DOI : 10.1021/cm00029a007
Synthesis and optical properties of tantalum oxide films prepared by ionized plasma-assisted pulsed laser deposition, Solid State Communications, vol.147, issue.3-4, p.90, 2008. ,
DOI : 10.1016/j.ssc.2008.05.007
Photo-Induced Atomic Layer Deposition of Tantalum Oxide Thin Films from Ta(OC[sub 2]H[sub 5])[sub 5] and O[sub 2], Journal of The Electrochemical Society, vol.151, issue.1, p.52, 2004. ,
DOI : 10.1149/1.1629096
Stress-induced leakage currents of the RF sputtered Ta2O5 on N-implanted silicon, Applied Surface Science, vol.253, issue.9, p.4396, 2007. ,
DOI : 10.1016/j.apsusc.2006.09.041