Etude, applications et améliorations de la technique LVI sur les défauts rencontrés dans les technologies CMOS avancées 45nm et inférieur.

Abstract : The Failure analysis plays an important role in the improvement of the performances and themanufacturing of integrated circuits. Defects can be present at any time in the product chain,during the conception (design), during the qualification, during the production, or still duringits use. It is important to study these defects in order to improve the reliability of the products.Furthermore, with the density increasing and the complexity of the chips, it is harder andharder to localize the defects. This thesis work consists to develop a new failure analysis technique based on the study of thereflected laser beam the "Laser Voltage Imaging" LVI, for the ultimate technologies (below45nm).
Complete list of metadatas

Cited literature [57 references]  Display  Hide  Download

https://tel.archives-ouvertes.fr/tel-00904697
Contributor : Abes Star <>
Submitted on : Friday, November 15, 2013 - 9:42:07 AM
Last modification on : Wednesday, January 31, 2018 - 4:38:31 AM
Long-term archiving on : Sunday, February 16, 2014 - 4:29:40 AM

File

CELI_GUILLAUME_2013.pdf
Version validated by the jury (STAR)

Identifiers

  • HAL Id : tel-00904697, version 1

Citation

Guillaume Celi. Etude, applications et améliorations de la technique LVI sur les défauts rencontrés dans les technologies CMOS avancées 45nm et inférieur.. Autre [cond-mat.other]. Université Sciences et Technologies - Bordeaux I, 2013. Français. ⟨NNT : 2013BOR14774⟩. ⟨tel-00904697⟩

Share

Metrics

Record views

395

Files downloads

623