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L. En, appliquè a tous les types de substrats, mais ce n'est pas le cas pour la lithographie e-beam. Elle nécessite l'utilisation d'un substrat conducteur. Pour cela une couche conductrice d'oxyde indiumétainindiumétain (ITO) d'une vingtaine de nanomètres estévaporéeestévaporée sur une lamelle de verre de 22 mm × 22 mm et 170 µm d'´ epais

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