Abstract : Quantum confined silicon, in the form of silicon quantum dots of diameters 5 nm or less, has the property of bandgap control and light emission. This bandgap engineering gives silicon quantum dots applications in novel photovoltaic devices, while maintaining compatibility with existing silicon technologies. These dots can help reduce lattice thermalisation losses in a single-junction solar cell. This work focusses on the large scale fabrication of silicon quantum dots in SiO2 using Plasma Enhanced Chemical Vapour Deposition (PECVD), followed by high-temperature annealing. Thick single layers are compared with multilayers for morphological, electrical and optical properties. Devices with these layers are compared with different electrode materials. Film thickness dependent organization of dots is observed in thick single layer structures which demonstrate improved electrical conductivity, but poor optical response. Multilayer films demonstrate augmented and controlled Si bandgaps and improved absorption in the blue-green visible range, accompanied by poor electrical conductivity. The improved optical properties are a promising sign for any potential photovoltaic integration.