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Relation microstructure et propriété mécanique des films de ZrO2 obtenus par MOCVD

Abstract : Pure ZrO2 films were deposited by MOCVD (Metal-Organic Chemical Vapor Deposition) by varying the deposition parameters over large range. The influence of deposition conditions on the evolution of the microstructure (morphology, crystal structure / phase, texture and residual stress) was studied and clarified. Through careful study and analysis of experimental results, three typical mechanisms of deposition of ZrO2 have been proposed. The compressive growth stresses are directly related to atomic diffusion and the trapped-in effects during deposition. The formation of crystallographic texture is complex and two types of textures were analyzed in the tetragonal phase: the fiber texture {1 1 0}t is supposed to be the result of the effect of superplastic of ZrO2 nano-crystallites and the compressive growth stress, while the facet morphology (the {0 1 1}t fiber) is due to the competitive growth of different crystallographic planes. The stabilization of the tetragonal phase of ZrO2 was analyzed and discussed. In addition to the critical size of crystallites, the stabilization of the tetragonal phase can be favored by two mechanisms: the large amount of crystal defects and morphology of crystallites.
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Submitted on : Monday, October 31, 2011 - 9:48:18 AM
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  • HAL Id : tel-00637177, version 1



Zhe Chen. Relation microstructure et propriété mécanique des films de ZrO2 obtenus par MOCVD. Autre. Université Paris Sud - Paris XI, 2011. Français. ⟨NNT : 2011PA112145⟩. ⟨tel-00637177⟩



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