Abstract : The development of calculable resistors based on ultra thin metallic films lies within a general purpose of enhancing of our knowledge of fundamental constants (fine structure α, von Klitzing RK, and Josephson KJ) which will probably constitute the future definition basis of the electric units in the International System. The National Laboratory of Metrology developed a new design of standard AC (alternative current) resistance, compact and strong, based on ultra thin metal film deposition. The Phase Vapor Deposition process is able to elaborate films whose composition, structure, adhesion, thickness or still homogeneity are controllable. That's why Ni80Cr20, Ni50Cr50 and evanohm thin film were thus deposited on cylindrical ceramic substrate by cathodic magnetron sputtering in an Alcatel SCM 450 type reactor. The final resistance values are obtained by high precision impedance measures (HP 3458A) and linked with the characteristics of films such as the thickness, the homogeneity (thickness and composition) or still the crystalline structure. A particular attention is also awarded to the effects of ageing and\or oxidation on the stability of the resistance values. Finally, we have to control ultra thin resistive film deposition on cylindrical substrate to obtain, considering the very weak thicknesses of coats, homogeneity on all the length of the ceramic stick and very strong resistivities by square. An improvement of the uncertainties in the determination of RK is waited with direct consequences on the future choices of the International Committee of the Weights and Measures concerning a possible redefining of the International System of unity.