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Theses

Nanostructuration par photolithographie DUV de matériaux organiques

Abstract : The main objective of this thesis was to develop a montage of lithography at 193 nm (Deep UV, DUV), to obtain nanostructures with a period of 100 nm on large surfaces (cm2) in different organic materials. Thus, an important part of this thesis was to establish an achromatic interferometer for the DUV, as well as methods for analyzing samples at different scales.
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Ali Dirani. Nanostructuration par photolithographie DUV de matériaux organiques. Autre. Université de Haute Alsace - Mulhouse, 2010. Français. ⟨NNT : 2010MULH3888⟩. ⟨tel-00602406⟩

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