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Etude d'une décharge hipims pour l'optimisation de l'adhérence et la croissance de nitrures de metaux de transition

Abstract : Recent technical needs has brought industrials to use materials such as superalloys, composites or "sandwiches" which require adapted tools during machining. However, no universal solution is yet available. The traditional tools wear out extremely quickly, and their cost remains prohibitive. To solve this problem, several directions can be foreseen. One can note the possibility to coat the tool to freeze as long as possible the geometry while providing it with new properties. However, to ensure high efficiency of the deposited thin film submitted to high stress level during cutting operations, it is essential that the layer has an excellent degree of adhesion with the substrate. Conditioned by the ion etching, adhesion can be increased through the use of processes promoting the creation of highly ionized plasmas and high energy as the High Power Impulse Magnetron Sputtering (HIPIMS). This technique can control the ion bombardment by applying a bias voltage at samples in order to significantly increase the efficiency of stripping. Ions, pre-oriented by the field lines of the magnetron, are thus attracted to the substrate, and per ballistic effect, will remove the surface atoms. The films prepared on samples treated and have excellent grip with good uniformity of thickness. The thesis work has therefore focused on the study of this new deposition process to understand and control this type of discharge to synthesize dense films of TiN, AlN and (Al,Ti)N, but also and especially to improve their adhesion. In a first step, and from bibliographic data, the advantages and disadvantages of HIPIMS discharge associated with the production of energetic metal ions are listed. In a second step, the electrical HIPIMS discharges are put forward for different magnetic configurations, working pressures, discharge voltages and polarisations of substrates to better understand how this new technique works, but also to find conditions for a sufficient ion etching to improve the adhesion of the films. Finally, to conduct further the study, the synthesis of coatings (Al, Ti) N is made toprovide additional information on the influence of the HIPIMS discharge on their chemical, structural and mechanical properties.
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Submitted on : Wednesday, June 8, 2011 - 12:21:40 PM
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  • HAL Id : tel-00599055, version 1



Amélie Guillaumot. Etude d'une décharge hipims pour l'optimisation de l'adhérence et la croissance de nitrures de metaux de transition. Energie électrique. Université de Technologie de Belfort-Montbeliard, 2009. Français. ⟨NNT : 2009BELF0115⟩. ⟨tel-00599055⟩



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