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CARACTÉRISATION PAR HOLOGRAPHIE ÉLECTRONIQUE ET SIMULATION DU DOPAGE 2D SUR SUBSTRAT SOI ULTRA-MINCE

Abstract : Off-axis electron holography is a transmission electron microscopy (TEM) based technique sensitive to the free carrier concentration. It enables 2D quantitative mapping of the electrostatic potential with a large field of view, and can therefore be compared to process simulation maps. The purpose of this PhD (CIFRE partnership between CEA-LETI and STMicroelectronics) was on one hand to set a protocol for sample preparation and observation by holography, and on the other hand to compare experimental results with TCAD process simulation. We first studied the influence of instrumental parameters on the signal to noise ratio in holography, and set optimisation rules for holography. Then, on elementary samples, we demonstrated the existence of an inactive layer and a potential underestimation due to TEM induced charges. These effects have been observed on both FIB and tripode prepared samples. The inactive layer is inversely proportional to the dopant concentration, and increase with the amount of crystalline defects induced by FIB at different energies. Finally, the knowledge of these artefacts enabled a semi-quantitative analysis of the potential in testing nMOS transistors on thin silicon film, and a calibration of arsenic implantation and diffusion in silicon. We also studied the practical limitations of holography for TCAD calibration.
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https://tel.archives-ouvertes.fr/tel-00587918
Contributor : Cyril Ailliot <>
Submitted on : Thursday, April 21, 2011 - 4:42:34 PM
Last modification on : Friday, October 23, 2020 - 4:41:10 PM

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  • HAL Id : tel-00587918, version 1

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CEA | UJF | DRT | LETI | CEA-GRE

Citation

Ailliot Cyril. CARACTÉRISATION PAR HOLOGRAPHIE ÉLECTRONIQUE ET SIMULATION DU DOPAGE 2D SUR SUBSTRAT SOI ULTRA-MINCE. Micro et nanotechnologies/Microélectronique. Université de Grenoble, 2010. Français. ⟨tel-00587918⟩

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