Skip to Main content Skip to Navigation
Theses

CARACTERISATIONS OPTIQUES ET ELECTRIQUE D'UN PLASMA DE CHLORE HAUTE DENSITE ET DES EFFETS DES INTERACTIONS PLASMA/SURFACE EN GRAVURE SILICIUM

Abstract : This work is dedicated to the study of inductive chlorine plasma, their interactions with the surface of reactor and their impact in the advanced etching in micro-electronics. We mainly used two in-situ, non-perturbatives plasma diagnostics : The electrostatic probe and the U.V. absorption spectroscopy. The plane electrostatic probe measure the ion flux to reactor walls. Due to a capacitive coupling, the probe is tolerant to surface deposition. It also works with electronegative plasma, even if, at high pressures, plasma inhomogeneities make the local flux on walls different from the ion flux on wafer. Absolute Cl2 concentration was determined by U.V. absorption and the dissociation rate deduced from it. From the global model of Lieberman which assumes the electronic temperature is independent from the RF power supply, a theoretical model was developed to calculate the dissociation rate. Cl2 dissociation mainly depends on the RF power and decreases when the pressure increases. Etching products like SiCl and SiCl2 was also measured. With the ion flux measurements, concentrations of those products result from sputtering etching. Adding CF4 in a chlorine plasma makes a progressive decrease of concentrations of chlorine-contained etching-products until a steady state. Return to pure chlorine plasmas makes a progressive increase. Chemistry changes surface state of the reactor which modifies chemical composition and the ion flux in the plasma. Vessel history is important for process drifts.
Document type :
Theses
Complete list of metadatas

https://tel.archives-ouvertes.fr/tel-00451384
Contributor : François Neuilly <>
Submitted on : Thursday, January 28, 2010 - 9:50:56 PM
Last modification on : Tuesday, September 11, 2018 - 11:00:02 AM
Long-term archiving on: : Friday, June 18, 2010 - 5:19:29 PM

Identifiers

  • HAL Id : tel-00451384, version 1

Collections

UJF | LIPHY | UGA | CNRS

Citation

François Neuilly. CARACTERISATIONS OPTIQUES ET ELECTRIQUE D'UN PLASMA DE CHLORE HAUTE DENSITE ET DES EFFETS DES INTERACTIONS PLASMA/SURFACE EN GRAVURE SILICIUM. Physique [physics]. Université Joseph-Fourier - Grenoble I, 2000. Français. ⟨tel-00451384⟩

Share

Metrics

Record views

285

Files downloads

2800