Effets de température dans les procédés de gravure plasma : Aspects fondamentaux et applications

Abstract : The objective of the thesis is to study the temperature and doping effects on the etching characteristics of Si and polymers: reaction products, etch rates, activation energy, anisotropy and selectivity. The anisotropic etching of polymers is studied as a function of temperature by using gas mixtures able to provide lateral wall passivation. The experimental results reported are analyzed in view of the thermodynamical study of the chemical systems considered. The final part is devoted to a feasibility study of microfilters via the etching of cylindrical pores through polymer films.
Document type :
Theses
Plasma Physics [physics.plasm-ph]. Université Joseph-Fourier - Grenoble I, 2008. French


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Submitted on : Wednesday, January 21, 2009 - 4:58:24 PM
Last modification on : Saturday, July 25, 2015 - 1:04:52 AM

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Min Koo. Effets de température dans les procédés de gravure plasma : Aspects fondamentaux et applications. Plasma Physics [physics.plasm-ph]. Université Joseph-Fourier - Grenoble I, 2008. French. <tel-00355029>

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