J. H. Almdal, F. S. Rosedale, G. D. Bates, G. H. Wignall, and . Fredrickson, Gaussian- to stretched-coil transition in block copolymer melts, Physical Review Letters, vol.65, issue.9, p.1112, 1990.
DOI : 10.1103/PhysRevLett.65.1112

T. Baron, F. Martin, P. Mur, C. Wyon, and M. Dupuy, Silicon quantum dot nucleation on Si3N4, SiO2 and SiOxNy substrates for nanoelectronic devices, Journal of Crystal Growth, vol.209, issue.4, p.1004, 2000.
DOI : 10.1016/S0022-0248(99)00742-3

T. Baron, A. Fernandes, J. F. Damlencourt, B. De-salvo, F. Martin et al., Growth of Si nanocrystals on alumina and integration in memory devices, Applied Physics Letters, vol.82, issue.23, p.4151, 2003.
DOI : 10.1063/1.1577409

URL : https://hal.archives-ouvertes.fr/hal-00477201

T. Baron, B. Pelissier, L. Perniola, F. Mazen, J. M. Hartmann et al., Chemical vapor deposition of Ge nanocrystals on SiO2, Applied Physics Letters, vol.83, issue.7, p.1444, 2003.
DOI : 10.1063/1.1604471

S. Bates, J. H. Rosedale, and G. H. Fredrickson, Fluctuation effects in a symmetric diblock copolymer near the order???disorder transition, The Journal of Chemical Physics, vol.92, issue.10, p.6255, 1990.
DOI : 10.1063/1.458350

C. T. Black, K. W. Guarini, K. R. Milkove, S. M. Baker, T. P. Russell et al., Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication, Applied Physics Letters, vol.79, issue.3, p.409, 2001.
DOI : 10.1063/1.1383805

C. T. Black, K. W. Guarini, Y. Zhang, H. Kim, J. Benedict et al., High-Capacity, Self-Assembled Metal???Oxide???Semiconductor Decoupling Capacitors, IEEE Electron Device Letters, vol.25, issue.9, p.622, 2004.
DOI : 10.1109/LED.2004.834637

C. A. Cheng, E. L. Ross, H. I. Thomas, G. J. Smith, and . Vansco, Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography, Advanced Materials, vol.15, issue.19, p.1599, 2003.
DOI : 10.1002/adma.200305244

C. Dalvi, C. E. Eastman, and T. P. Lodge, Diffusion in microstructured block copolymers: Chain localization and entanglements, Physical Review Letters, vol.71, issue.16, p.2591, 1993.
DOI : 10.1103/PhysRevLett.71.2591

H. Fredrickson and E. J. Helfand, Fluctuation effects in the theory of microphase separation in block copolymers, The Journal of Chemical Physics, vol.87, issue.1, p.697, 1987.
DOI : 10.1063/1.453566

K. Fried and . Binder, The microphase separation transition in symmetric diblock copolymer melts: A Monte Carlo study, The Journal of Chemical Physics, vol.94, issue.12, p.8349, 1991.
DOI : 10.1063/1.460067

W. Guarini, C. T. Black, K. R. Milkove, and R. L. , Nanoscale patterning using self-assembled polymers for semiconductor applications, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.19, issue.6, p.2784, 2001.
DOI : 10.1116/1.1421551

A. Hajduk, H. Takenouchi, M. A. Hillmyer, F. S. Bates, M. E. Vigild et al., Stability of the Perforated Layer (PL) Phase in Diblock Copolymer Melts, Macromolecules, vol.30, issue.13, p.3788, 1997.
DOI : 10.1021/ma961673y

M. W. Hamersky, M. A. Hilmyer, M. Tirrell, F. S. Bates, T. P. Lodge et al., Block Copolymer Self-Diffusion in the Gyroid and Cylinder Morphologies, Macromolecules, vol.31, issue.16, p.5363, 1998.
DOI : 10.1021/ma971476e

D. Han, J. Kim, and J. K. Kim, Determination of the order-disorder transition temperature of block copolymers, Macromolecules, vol.22, issue.1, p.383, 1989.
DOI : 10.1021/ma00191a071

M. Harrison, P. M. Park, R. A. Chaikin, D. H. Register, and . Adamson, Lithography with a mask of block copolymer microstructures, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.16, issue.2, p.544, 1997.
DOI : 10.1116/1.589860

D. Y. Jeong, D. H. Ryu, J. K. Hho, J. T. Kim, D. H. Goldbach et al., Enhancement in the Orientation of the Microdomain in Block Copolymer Thin Films upon the Addition of Homopolymer, Advanced Materials, vol.16, issue.6, p.533, 2007.
DOI : 10.1002/adma.200306113

M. Kanoun, A. Souifi, T. Baron, and F. Mazen, -type nonvolatile memory applications, Applied Physics Letters, vol.84, issue.25, p.5079, 2004.
DOI : 10.1063/1.1751227

URL : https://hal.archives-ouvertes.fr/hal-00207848

A. K. Khandpur, S. Forster, F. S. Bates, I. W. Hamley, A. J. Ryan et al., Polyisoprene-Polystyrene Diblock Copolymer Phase Diagram near the Order-Disorder Transition, Macromolecules, vol.28, issue.26, p.8796, 1995.
DOI : 10.1021/ma00130a012

H. Lammertink, M. A. Hempenius, J. E. Van-den-enk, V. Z. Chan, E. L. Thomas et al., Nanostructured Thin Films of Organic-Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching, Advanced Materials, vol.12, issue.2, p.98, 2000.
DOI : 10.1002/(SICI)1521-4095(200001)12:2<98::AID-ADMA98>3.0.CO;2-5

C. Lee, J. Meteer, V. Narayanan, and E. C. Kan, Self-assembly of metal nanocrystals on ultrathin oxide for nonvolatile memory applications, Journal of Electronic Materials, vol.48, issue.1, p.1, 2005.
DOI : 10.1007/s11664-005-0172-8

M. W. Matsen and F. S. Bates, Stable and unstable phases of a diblock copolymer melt, Physical Review Letters, vol.72, issue.16, p.2660, 1994.
DOI : 10.1103/PhysRevLett.72.2660

M. W. Matsen and F. S. Bates, Conformationally asymmetric block copolymers, Journal of Polymer Science Part B: Polymer Physics, vol.35, issue.6, p.945, 1997.
DOI : 10.1002/(SICI)1099-0488(19970430)35:6<945::AID-POLB9>3.0.CO;2-G

URL : http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.622.2237

S. Miyazaki, Y. Hamamoto, E. Yoshida, M. Ikeda, and M. Hirose, Control of self-assembling formation of nanometer silicon dots by low pressure chemical vapor deposition, Thin Solid Films, vol.369, issue.1-2, p.55, 2000.
DOI : 10.1016/S0040-6090(00)00834-8

C. Park, P. M. Harrison, R. A. Chaikin, D. H. Register, and . Adamson, Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1&nbsp;Square Centimeter, Science, vol.276, issue.5317, p.1401, 1998.
DOI : 10.1126/science.276.5317.1401

M. Park, P. M. Chaikin, R. A. Register, and D. H. Adamson, Large area dense nanoscale patterning of arbitrary surfaces, Applied Physics Letters, vol.79, issue.2, p.257, 2001.
DOI : 10.1063/1.1378046

B. Perniola, G. De-salvo, A. Ghibaudo, G. Foglio-para, V. Panankakis et al., Modeling of the programming window distribution in multinanocrystals memories, IEEE Transactions On Nanotechnology, vol.2, issue.4, p.277, 2003.
DOI : 10.1109/TNANO.2003.820782

URL : https://hal.archives-ouvertes.fr/hal-00477194

H. Rosedale, F. S. Bates, K. Almdal, K. Mortensen, and G. D. Wignall, Order and Disorder in Symmetric Diblock Copolymer Melts, Macromolecules, vol.28, issue.5, p.1429, 1995.
DOI : 10.1021/ma00109a014

T. Sakamoto and . Hashimoto, Order-Disorder Transition of Low Molecular Weight Polystyrene-block-Polyisoprene. 1. SAXS Analysis of Two Characteristic Temperatures, Macromolecules, vol.28, issue.20, p.6825, 1995.
DOI : 10.1021/ma00124a018

R. Stuhn, T. Mutter, and . Thurn-albrecht, Direct Observation of Structure Formation at the Temperature-Driven Order-To-Disorder Transition in Diblock Copolymers, Europhysics Letters (EPL), vol.18, issue.5, p.427, 1992.
DOI : 10.1209/0295-5075/18/5/009

J. Albrecht, A. Schotter, N. Kastle, T. Emley, T. Shibauchi et al., Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates, Science, vol.290, issue.5499, p.2126, 2000.
DOI : 10.1126/science.290.5499.2126

R. Albrecht, J. Steiner, C. M. Derouchey, E. Stafford, M. Huang et al., Nanoscopic Templates from Oriented Block Copolymer Films, Advanced Materials, vol.12, issue.11, p.787, 2000.
DOI : 10.1002/(SICI)1521-4095(200006)12:11<787::AID-ADMA787>3.0.CO;2-1

E. J. Yokoyama, G. H. Kramer, and . Fredrickson, Simulation of Diffusion of Asymmetric Diblock and Triblock Copolymers in a Spherical Domain Structure, Macromolecules, vol.33, issue.6, p.2249, 2000.
DOI : 10.1021/ma991203e

H. Yokoyama and E. J. Kramer, Diffusion of Triblock Copolymers in a Spherical Domain Structure, Macromolecules, vol.33, issue.3, p.954, 2000.
DOI : 10.1021/ma991202m

J. Brandup and E. H. Immergut, Polymer handbook, Bra, vol.89, 1989.

J. Hawker, A. W. Bosman, and E. Harth, New Polymer Synthesis by Nitroxide Mediated Living Radical Polymerizations, Chemical Reviews, vol.101, issue.12, p.3661, 2001.
DOI : 10.1021/cr990119u

M. W. Matsen and F. S. Bates, Conformationally asymmetric block copolymers, Journal of Polymer Science Part B: Polymer Physics, vol.35, issue.6, p.945, 1997.
DOI : 10.1002/(SICI)1099-0488(19970430)35:6<945::AID-POLB9>3.0.CO;2-G

URL : http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.622.2237

P. Balsara, B. A. Garetz, M. C. Newstein, B. J. Bauer, and T. J. Prosa, Evolution of Microstructure in the Liquid and Crystal Directions in a Quenched Block Copolymer Melt, Macromolecules, vol.31, issue.22, p.7668, 1998.
DOI : 10.1021/ma9809637

P. Balsara, C. M. Marques, B. A. Garetz, M. C. Newstein, and S. P. Gido, Anisotropy of lamellar block copolymer grains, Physical Review E, vol.66, issue.5, p.52802, 2002.
DOI : 10.1103/PhysRevE.66.052802

E. Bandyopadhyay, L. Tan, S. Ho, S. M. Bundick, A. Baker et al., Deposition of DNA-Functionalized Gold Nanospheres into Nanoporous Surfaces, Langmuir, vol.22, issue.11, p.4978, 2006.
DOI : 10.1021/la0534773

G. D. Byutner and . Smith, Temperature and molecular weight dependence of the zero shear-rate viscosity of an entangled polymer melt from simulation and theory, Journal of Polymer Science Part B: Polymer Physics, vol.31, issue.23, p.3067, 2001.
DOI : 10.1002/polb.10029

H. Fredrickson and E. J. Helfand, Fluctuation effects in the theory of microphase separation in block copolymers, The Journal of Chemical Physics, vol.87, issue.1, p.697, 1987.
DOI : 10.1063/1.453566

T. Geisinger, M. Muller, and K. Binder, Symmetric diblock copolymers in thin films. I. Phase stability in self-consistent field calculations and Monte Carlo simulations, The Journal of Chemical Physics, vol.111, issue.11, p.5241, 1999.
DOI : 10.1063/1.479778

W. Guarini, C. T. Black, K. R. Milkove, and R. L. , Nanoscale patterning using self-assembled polymers for semiconductor applications, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.19, issue.6, p.2784, 2001.
DOI : 10.1116/1.1421551

W. Guarini, C. T. Black, and S. H. Yeug, Optimization of Diblock Copolymer Thin Film Self Assembly, Advanced Materials, vol.14, issue.18, p.1290, 2002.
DOI : 10.1002/1521-4095(20020916)14:18<1290::AID-ADMA1290>3.0.CO;2-N

T. Hashimoto and N. Sakamoto, Nucleation and Anisotropic Growth of Lamellar Microdomains in Block Copolymers, Macromolecules, vol.28, issue.13, p.4779, 1995.
DOI : 10.1021/ma00117a070

N. Hashimoto, T. Sakamoto, and . Koga, Nucleation and growth of anisotropic grain in block copolymers near order-disorder transition, Physical Review E, vol.54, issue.5, p.5832, 1996.
DOI : 10.1103/PhysRevE.54.5832

T. Hashimoto, N. Ogawa, M. Sakamoto, J. K. Ichimiya, C. D. Kim et al., Small-angle X-ray scattering and rheological studies on the ordering process of cylindrical microdomains in a polystyrene-block-polyisoprene copolymer, Polymer, vol.39, issue.8-9, p.1573, 1998.
DOI : 10.1016/S0032-3861(97)00442-4

S. Henkee, E. L. Thomas, and L. J. Fetters, The effect of surface constraints on the ordering of block copolymer domains, Journal of Materials Science, vol.53, issue.5, p.1685, 1988.
DOI : 10.1007/BF01115708

C. Kim and T. P. Russell, Ordering in thin films of asymmetric diblock copolymers, Journal of Polymer Science Part B: Polymer Physics, vol.33, issue.6, p.663, 2000.
DOI : 10.1002/1099-0488(20010315)39:6<663::AID-POLB1040>3.0.CO;2-K

R. Knoll, G. Margele, and . Krausch, Phase behavior in thin films of cylinder-forming ABA block copolymers: Experiments, The Journal of Chemical Physics, vol.120, issue.2, p.1105, 2004.
DOI : 10.1063/1.1627324

T. Lin, T. P. Kerle, E. Russell, U. Schaffer, and . Steiner, Structure Formation at the Interface of Liquid/Liquid Bilayer in Electric Field, Macromolecules, vol.35, issue.10, p.3971, 2002.
DOI : 10.1021/ma0122425

M. W. Matsen and M. D. Whitmore, Accurate diblock copolymer phase boundaries at strong segregations, The Journal of Chemical Physics, vol.105, issue.21, p.9698, 1996.
DOI : 10.1063/1.472799

M. A. Modi, R. Krishnamoorti, M. F. Tse, and H. C. Wang, Viscoelastic Characterization of an Order???Order Transition in a Mixture of Di- and Triblock Copolymers, Macromolecules, vol.32, issue.12, p.4088, 1999.
DOI : 10.1021/ma982018o

B. A. Newstein, H. J. Garetz, N. P. Dai, and . Balsara, Light Scattering and Microscopy from Block Copolymers with Cylindrical Morphology, Macromolecules, vol.28, issue.13, p.4587, 1995.
DOI : 10.1021/ma00117a032

K. Niemz, E. Bandyopadhyay, K. Tan, S. M. Cha, and . Baker, Fabrication of Nanoporous Templates from Diblock Copolymer Thin Films on Alkylchlorosilane-Neutralized Surfaces, Langmuir, vol.22, issue.26, p.11092, 2006.
DOI : 10.1021/la062594a

R. D. Peters, X. M. Yang, T. K. Kim, B. H. Sohn, and P. F. Nealey, Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers, Langmuir, vol.16, issue.10, p.4625, 2000.
DOI : 10.1021/la991500c

G. G. Pereira, Cylindrical phase of block copolymers:??????Stability of circular configuration to elliptical distortions and thin film morphologies, Physical Review E, vol.63, issue.6, p.61809, 2001.
DOI : 10.1103/PhysRevE.63.061809

G. T. Pickett and A. C. Balzacs, Equilibrium Orientation of Confined Diblock Copolymer Films, Macromolecules, vol.30, issue.10, p.3097, 1997.
DOI : 10.1021/ma9617173

T. P. Russell, R. P. Hjelm, and P. A. Seeger, Temperature dependence of the interaction parameter of polystyrene and poly(methyl methacrylate), Macromolecules, vol.23, issue.3, p.890, 1990.
DOI : 10.1021/ma00205a033

Y. Ryu, K. Shin, E. Drockenmuller, C. Hawker, and T. P. Russell, A Generalized Approach to the Modification of Solid Surfaces, Science, vol.308, issue.5719, p.236, 2005.
DOI : 10.1126/science.1106604

T. Sakamoto and . Hashimoto, -polyisoprene. 2. Real-Space Analysis on the Formation of Lamellar Microdomain, Macromolecules, vol.31, issue.12, p.3815, 1998.
DOI : 10.1021/ma980037s

URL : https://hal.archives-ouvertes.fr/inserm-00857933

A. N. Semenov, Phase equilibria in block copolymer-homopolymer mixtures, Macromolecules, vol.26, issue.9, p.2273, 1993.
DOI : 10.1021/ma00061a021

Y. S. Suh, H. H. Kim, and . Lee, Parallel and vertical morphologies in block copolymers of cylindrical domain, The Journal of Chemical Physics, vol.108, issue.3, p.1253, 1998.
DOI : 10.1063/1.475487

A. Stuhn, H. G. Vilesov, T. Zachmann, and . Hashimoto, Structure Relaxation and Metastable States at the Microphase Separation Transition in Diblock Copolymers: Experiments with Time-Resolved Small-Angle X-ray Scattering, Macromolecules, vol.27, issue.13, p.3560, 1994.
DOI : 10.1021/ma00091a017

P. F. Wang, J. J. Nealey, and . De-pablo, Monte Carlo Simulations of Asymmetric Diblock Copolymer Thin Films Confined between Two Homogeneous Surfaces, Macromolecules, vol.34, issue.10, p.3458, 2001.
DOI : 10.1021/ma0018751

T. Xu, H. C. Kim, J. Derouchey, C. Seney, C. Levesque et al., The influence of molecular weight on nanoporous polymer films, Polymer, vol.42, issue.21, p.9091, 2001.
DOI : 10.1016/S0032-3861(01)00376-7

T. E. Yokoyama, E. J. Mates, and . Kramer, Structure of Asymmetric Diblock Copolymers in Thin Films, Macromolecules, vol.33, issue.5, p.1888, 2000.
DOI : 10.1021/ma9912047

E. Bechinger and . Frey, Phase behaviour of colloids in confining geometry, Journal of Physics: Condensed Matter, vol.13, issue.20, p.321, 2001.
DOI : 10.1088/0953-8984/13/20/201

S. T. Chui, Grain-Boundary Theory of Melting in Two Dimensions, Physical Review Letters, vol.48, issue.14, p.933, 1982.
DOI : 10.1103/PhysRevLett.48.933

W. Edwards, M. P. Stoykovich, H. H. Solak, and P. F. Nealy, Long-Range Order and Orientation of Cylinder-Forming Block Copolymers on Chemically Nanopatterned Striped Surfaces, Macromolecules, vol.39, issue.10, p.3598, 2006.
DOI : 10.1021/ma052335c

S. H. Kim, M. J. Misner, and T. P. Russell, Solvent-Induced Ordering in Thin Film Diblock Copolymer/Homopolymer Mixtures, Advanced Materials, vol.11, issue.23-24, p.2119, 2004.
DOI : 10.1002/adma.200306577

S. H. Kim, M. J. Misner, T. Xu, M. Kimura, and T. P. Russell, Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation, Advanced Materials, vol.16, issue.3, p.226, 2004.
DOI : 10.1002/adma.200304906

M. W. Matsen, Cylinder???sphere epitaxial transitions in block copolymer melts, The Journal of Chemical Physics, vol.114, issue.18, p.8165, 2001.
DOI : 10.1063/1.1365085

M. W. Matsen, Comment on ???Cylindrical phase of block copolymers: Stability of circular configuration to elliptical distortions and thin film morphologies???, Physical Review E, vol.67, issue.2, p.23801, 2003.
DOI : 10.1103/PhysRevE.67.023801

T. L. Morkved, M. Lu, A. M. Urbas, E. E. Ehrichs, H. M. Jaeger et al., Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields, Science, vol.273, issue.5277, p.931, 1996.
DOI : 10.1126/science.273.5277.931

G. G. Pereira, Undulational instabilities of the columnar phase of diblock copolymers, The Journal of Chemical Physics, vol.117, issue.4, p.1878, 2001.
DOI : 10.1063/1.1488582

R. A. Quinn, C. J. Goree, and J. B. Pieper, Structural analysis of a Coulomb lattice in a dusty plasma, Physical Review E, vol.53, issue.3, p.2049, 1996.
DOI : 10.1103/PhysRevE.53.R2049

P. D. Olmsted and S. T. Milner, Strong Segregation Theory of Bicontinuous Phases in Block Copolymers, Macromolecules, vol.31, issue.12, p.4011, 1998.
DOI : 10.1021/ma980043o

X. M. Xiao, E. W. Yang, Y. H. Edwards, P. F. La, and . Nealy, Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays, Nanotechnology, vol.16, issue.7, p.324, 2005.
DOI : 10.1088/0957-4484/16/7/003

Y. Yokojima and . Shiwa, Ordering process in quenched block copolymers at low temperatures, Physical Review E, vol.62, issue.5, p.6838, 2000.
DOI : 10.1103/PhysRevE.62.6838

Y. Yokojima and . Shiwa, Hydrodynamic interactions in ordering process of two-dimensional quenched block copolymers, Physical Review E, vol.65, issue.5, p.56308, 2002.
DOI : 10.1103/PhysRevE.65.056308

V. Figure, Images MEB de la surface de l'oxyde après différents temps de gravure à l'aide d'un plasma CF 4 puis retrait du masque de PS : (a) 5 secondes et (b) 20 secondes. Les barres rouges correspondent à 300 nm. (c) Distribution des diamètres des pores du masque de PS après 5 secondes de gravure avec un plasma CF 4

V. Tableau, Le temps de gravure du plasma Ar diffère en fonction du métal déposé. La Figure V.9 présente des images MEB de plots métalliques après retrait du masque de PS. Sur la Fig. V.9(a) est montré un réseau hexagonal de plots de Pt. Après binarisation de l'image à l'aide du logiciel NI Vision assistant, on obtient un taux de recouvrement de l'image par les plots de

F. Sur-la, on peut observer que les plots d'Au obtenus recouvrent beaucoup moins la surface du substrat. En fait, après analyse de cette image, nous obtenons un taux de recouvrement de 27

V. Figure, Images MEB présentant différents types de plots métalliques après retrait de du masque de PS : (a) Pt et (b) Au. Le taux de recouvrement de l'image est 63,3% par les plots de Pt et de 27

V. Sur-la-figure, nous montrons des réseaux de plots de Pt après retrait de la matrice de PS. La Fig. V.10(a) a été réalisé en ayant préalablement procédé au retrait des couches de PMMA et PS-s-PMMA à l'aide du traitement compatible avec une filière 200 mm

R. P. Anantatmula, A. A. Johnson, S. P. Gupta, and R. J. Horylev, The gold-silicon phase diagram, Journal of Electronic Materials, vol.233, issue.3, p.445, 1975.
DOI : 10.1007/BF02666229

G. Choi, J. Jeong, K. Kwon, H. Jung, S. Shin et al., Magnetic nanodot arrays patterned by selective ion etching using block copolymer templates, Nanotechnology, vol.15, issue.8, p.970, 2004.
DOI : 10.1088/0957-4484/15/8/018

W. Guarini, C. T. Black, K. R. Milkove, and R. L. , Nanoscale patterning using self-assembled polymers for semiconductor applications, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.19, issue.6, p.2784, 2001.
DOI : 10.1116/1.1421551

Y. Huang, H. Wu, N. Fang, T. Deng, J. Ren et al., quantum dot arrays fabricated by templated catalytic etching, Nanotechnology, vol.17, issue.5, p.1476, 2006.
DOI : 10.1088/0957-4484/17/5/052

S. Monget, F. H. Vallon, L. Bell, O. Vallier, and . Joubert, X-Ray Photoelectron Spectroscopy Analyses of Oxide-Masked Polycrystalline SiGe Features Etched in a High-Density Plasma Source, Journal of The Electrochemical Society, vol.144, issue.7, p.2455, 1997.
DOI : 10.1149/1.1837836

S. Oehrlein, J. F. Rembetski, and E. H. Payne, Study of sidewall passivation and microscopic silicon roughness phenomena in chlorine-based reactive ion etching of silicon trenches, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.8, issue.6, p.1199, 1990.
DOI : 10.1116/1.584896

D. Shahrjerbi, D. I. Garcia-gutirrez, and S. K. Banerjee, Fabrication of Ni Nanocrystal Flash Memories Using a Polymeric Self-Assembly Approach, IEEE Electron Device Letters, vol.28, issue.9, p.793, 2007.
DOI : 10.1109/LED.2007.902612

K. Shin, K. A. Leach, J. T. Goldbach, D. H. Kim, J. Y. Jho et al., A Simple Route to Metal Nanodots and Nanoporous Metal Films, Nano Letters, vol.2, issue.9, p.933, 2002.
DOI : 10.1021/nl0256560

S. Xiao, X. Yang, E. W. Eduards, Y. La, and P. F. Nealey, Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays, Nanotechnology, vol.16, issue.7, p.324, 2005.
DOI : 10.1088/0957-4484/16/7/003

T. Xu, J. Stevens, J. A. Villa, J. T. Goldbach, K. W. Guarini et al., Block Copolymer Surface Reconstuction: A Reversible Route to Nanoporous Films, Advanced Functional Materials, vol.13, issue.9, p.698, 2003.
DOI : 10.1002/adfm.200304374

R. T. Zhao, S. Haasch, and . Maclaren, Solvent-Induced Self-Assembly of Mixed Poly(methyl methacrylate)/Polystyrene Brushes on Planar Silica Substrates:?? Molecular Weight Effect, Journal of the American Chemical Society, vol.126, issue.19, p.6124, 2004.
DOI : 10.1021/ja049570f

P. D. Olmsted and S. Milner, Strong Segregation Theory of Bicontinuous Phases in Block Copolymers, Macromolecules, vol.31, issue.12, p.4011, 1998.
DOI : 10.1021/ma980043o