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Lithographie de nouvelle génération par nanoimpression assistée par UV: étude et développement de matériaux et procédés pour l'application microélectronique

Abstract : The UV curing nanoimprint lithography (UV-NIL) is a next generation lithography technique that can produce very tinny patterns (in the nanometer scale) by a simple imprinting step performed with a patterned and transparent template in a flowable resist. This imprinting step is then followed by a UV flash that cures the resist. Due to its high potential in replicating patterns with high resolution, UV-NIL is considered nowadays as a possible candidate to perform the lithographic step in the next generation integrated circuits. In UV-NIL, the resist can either be deposited by a drop-dispense system or by spin-coating. During this Ph.D., the spin-coating approach was chosen.
At first, some template fabrication processes and a UV-NIL dedicated resist were developed. Then, the integration criteria of UV-NIL in the microelectronics industry were investigated, and more precisely the imprinting and the cured resist etching steps. Finally, it was demonstrated that the UV-NIL spin-coating approach can replicate patterns under certain conditions on the patterns geometry (size and density) to reach a low and uniform residual layer thickness.
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Contributor : Pauline Voisin <>
Submitted on : Friday, March 7, 2008 - 12:47:44 PM
Last modification on : Tuesday, February 16, 2021 - 3:33:47 AM
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Pauline Voisin. Lithographie de nouvelle génération par nanoimpression assistée par UV: étude et développement de matériaux et procédés pour l'application microélectronique. Micro et nanotechnologies/Microélectronique. Université Joseph-Fourier - Grenoble I, 2007. Français. ⟨tel-00180907⟩

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