R. Agostino, P. Favia, F. Fracassi, . Nato, and . Series, Plasma Processing of Polymers, 1997.

H. Yasuda, Plasma Polymerization, 1985.
DOI : 10.1016/B978-0-08-096701-1.00136-1

T. Gengenbach, R. Chatelier, and H. Griesser, Characterization of the Ageing of Plasma-deposited Polymer Films: Global Analysis of X-ray Photoelectron Spectroscopy Data, Surface and Interface Analysis, vol.2, issue.4, pp.271-281, 1996.
DOI : 10.1002/(SICI)1096-9918(199604)24:4<271::AID-SIA116>3.0.CO;2-J

S. Roualdes, R. Berjoan, and J. Durand, 29Si NMR and Si2p XPS correlation in polysiloxane membranes prepared by plasma enhanced chemical vapor deposition, Separation and Purification Technology, vol.25, issue.1-3, pp.391-397, 2001.
DOI : 10.1016/S1383-5866(01)00067-3

A. Bousquet, V. Bursikova, A. Goullet, A. Djouadi, L. Zajickova et al., Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas, Surface and Coatings Technology, vol.200, issue.22-23, pp.6517-6521, 2006.
DOI : 10.1016/j.surfcoat.2005.11.025
URL : https://hal.archives-ouvertes.fr/hal-00379609

E. J. Mort, F. Jansen, and C. Pr, Plasma Deposited Thin Films, 1986.

F. Nascimento, M. Da-silva, E. Galeazzo, and N. Demarquette, Use of plasma polymerized highly polar organic compound films for sensor development, Sensors and Actuators B: Chemical, vol.91, issue.1-3, pp.370-377, 2003.
DOI : 10.1016/S0925-4005(03)00111-4

Y. Wong, W. Kang, J. Davidson, A. Wisitsora, and K. Soh, A novel microelectronic gas sensor utilizing carbon nanotubes for hydrogen gas detection, Sensors and Actuators B: Chemical, vol.93, issue.1-3, pp.327-332, 2003.
DOI : 10.1016/S0925-4005(03)00213-2

S. Roualdès, J. Sanchez, and J. Durand, Gas diffusion and sorption properties of polysiloxane membranes prepared by PECVD, Journal of Membrane Science, vol.198, issue.2, pp.299-310, 2002.
DOI : 10.1016/S0376-7388(01)00667-6

X. Pagès, V. Rouessac, D. Cot, G. Nabias, J. Durand et al., Gas permeation of PECVD membranes inside alumina substrate tubes, Separation and Purification Technology, vol.25, issue.1-3, pp.399-406, 2001.
DOI : 10.1016/S1383-5866(01)00068-5

V. Rouessac, S. Roualdès, and J. Durand, In-Situ Mass Spectrometry Analyses of the Fragmentation of Linear and Cyclic Siloxanes in a Glow Discharge Compared with Ex-Situ FTIR Analyses of the Deposits, Chemical Vapor Deposition, vol.8, issue.4, pp.155-161, 2002.
DOI : 10.1002/1521-3862(20020704)8:4<155::AID-CVDE155>3.0.CO;2-R
URL : https://hal.archives-ouvertes.fr/hal-00450194

G. Abbas, P. Papakonstantinou, T. Okpalugo, J. Mclaughlin, J. Filik et al., The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation, Thin Solid Films, vol.482, issue.1-2, pp.201-206, 2005.
DOI : 10.1016/j.tsf.2004.11.174

G. Rochat, Y. Leterrier, P. Fayet, and J. Manson, Stress controlled gas-barrier oxide coatings on semi-crystalline polymers, Thin Solid Films, vol.484, issue.1-2, pp.94-99, 2005.
DOI : 10.1016/j.tsf.2005.02.020

Y. Shioya, T. Ishimaru, H. Ikakura, Y. Nishimoto, T. Ohdaira et al., Copper Barrier Properties of Low Dielectric Constant SiOCNH Film Deposited by Plasma-Enhanced CVD, Journal of The Electrochemical Society, vol.151, issue.1, pp.56-61, 2004.
DOI : 10.1149/1.1629099

R. Ecke, S. Schultz, M. Hecker, N. Mattern, and T. Gessner, Influence of SiH4 on the WNx-PECVD process, Microelectronic Engineering, vol.70, issue.2-4, pp.346-351, 2003.
DOI : 10.1016/S0167-9317(03)00430-1

C. Chen, F. Chia, C. Hsu, and I. Li, Growth and characteristics of carbon nanotubes on carbon cloth as electrodes, Diamond and Related Materials, vol.14, issue.3-7, pp.770-773, 2005.
DOI : 10.1016/j.diamond.2004.12.038

D. Kim, S. Aulice, S. Kwak, I. Oh, and Y. Heung, Nano-silica layered composite membranes prepared by PECVD for direct methanol fuel cells, Electrochemistry Communications, vol.6, issue.10, pp.1069-1074, 2004.
DOI : 10.1016/j.elecom.2004.07.006

R. Foest, E. Kindel, A. Ohl, M. Steiber, K. Weltmann et al., Non-thermal atmospheric pressure discharges for surface modification, Plasma Physics and Controlled Fusion, vol.47, issue.12B, pp.525-536, 2005.
DOI : 10.1088/0741-3335/47/12B/S38

J. Zhang, D. Wavhal, and E. Fisher, Mechanisms of SiO2 film deposition from tetramethylcyclotetrasiloxane, dimethyldimethoxysilane, and trimethylsilane plasmas, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.22, issue.1, pp.201-213, 2004.
DOI : 10.1116/1.1635392

K. Aumaille, A. Granier, B. Grolleau, and G. Turban, Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas, Journal of Applied Physics, vol.89, issue.9, pp.5227-5229, 2001.
DOI : 10.1063/1.1355694

D. Wavhal, Z. Jianming, M. Steen, and E. Fisher, Investigation of Gas Phase Species and Deposition of SiO2 Films from HMDSO/O2 Plasmas, Plasma Processes and Polymers, vol.9, issue.3, pp.276-287, 2006.
DOI : 10.1002/ppap.200500140

D. Magni, C. Deschenaux, C. Hollenstein, A. Creatore, and P. Fayet, infrared absorption spectroscopy and mass spectrometry, Journal of Physics D: Applied Physics, vol.34, issue.1, pp.87-94, 2001.
DOI : 10.1088/0022-3727/34/1/315

T. Stelzner, M. Arold, F. Falk, H. Stafast, D. Probst et al., Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry, Surface and Coatings Technology, vol.200, issue.1-4, pp.372-376, 2005.
DOI : 10.1016/j.surfcoat.2005.02.077

W. Kessels, F. Van-assche, J. Hong, D. Schram, and M. Van-de-sanden, Plasma diagnostic study of silicon nitride film growth in a remote Ar???H2???N2???SiH4 plasma: Role of N and SiHn radicals, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.22, issue.1, pp.96-106, 2004.
DOI : 10.1116/1.1631294

A. Kovats and P. Deak, Gas composition at the substrate in MW-CVD diamond growth: An old problem revisited, Diamond and Related Materials, vol.14, issue.9, pp.1517-1521, 2005.
DOI : 10.1016/j.diamond.2005.04.003

O. Aubry, J. Delfau, C. Met, L. Vanderbulke, and C. Vovelle, Precursors of diamond films analysed by molecular beam mass spectrometry of microwave plasmas, Diamond and Related Materials, vol.13, issue.1, pp.116-124, 2004.
DOI : 10.1016/j.diamond.2003.09.009
URL : https://hal.archives-ouvertes.fr/hal-00444685

J. Petherbridge, P. May, G. Fuge, K. Rosser, M. Ashfold et al., In situ plasma diagnostics of the chemistry behind sulfur doping of CVD diamond films, Diamond and Related Materials, vol.11, issue.3-6, pp.301-306, 2002.
DOI : 10.1016/S0925-9635(01)00576-3

D. Guerin, D. Hinshelwood, S. Monolache, F. Denes, and V. Shamamian, Plasma Polymerization of Thin Films:?? Correlations between Plasma Chemistry and Thin Film Character, Langmuir, vol.18, issue.10, pp.4118-4123, 2002.
DOI : 10.1021/la011566j

B. Cho, S. Lao, and J. Chang, Origin and effect of impurity incorporation in plasma-enhanced ZrO2 deposition, Journal of Applied Physics, vol.93, issue.11, pp.9345-9351, 2003.
DOI : 10.1063/1.1572193

J. Gavallet, T. Belmonte, D. Hertz, and H. Michel, Low temperature zirconia thin film synthesis by a chemical vapour deposition process involving ZrCl4 and O2???H2???Ar microwave post-discharges. Comparison with a conventional CVD hydrolysis process, Thin Solid Films, vol.301, issue.1-2, pp.35-44, 1997.
DOI : 10.1016/S0040-6090(96)09526-0

J. Pulpytel, F. Arefi-khonsari, and W. Morscheidt, by PACVD, Journal of Physics D: Applied Physics, vol.38, issue.9, pp.1390-1395, 2005.
DOI : 10.1088/0022-3727/38/9/010

W. Morscheidt, K. Hasssouni, F. Arefi-khonsari, F. Khonsari, J. Amouroux et al., Modelling and experimental study of an O2/Ar/tetramethyltin discharge used for the deposition of transparent conductive thin tin oxide films, Thin Solid Films, vol.427, issue.1-2, pp.219-224, 2003.
DOI : 10.1016/S0040-6090(02)01215-4

V. Rouessac, P. Tuluc, and J. Durand, Composite plasma-polymerized organosiloxane-based material for hydrocarbon vapor selectivity, Journal of Membrane Science, vol.230, issue.1-2, pp.49-59, 2004.
DOI : 10.1016/j.memsci.2003.09.025
URL : https://hal.archives-ouvertes.fr/hal-00450228

S. Roualdès, J. Durand, and R. Field, Comparative performance of various plasma polysiloxane films for the pervaporative recovery of organics from aqueous streams, Journal of Membrane Science, vol.211, issue.1, pp.113-126, 2003.
DOI : 10.1016/S0376-7388(02)00411-8

W. Sohn, D. Ryu, S. Oh, and J. Koo, A study on the development of composite membranes for the separation of organic vapors, Journal of Membrane Science, vol.175, issue.2, pp.163-170, 2000.
DOI : 10.1016/S0376-7388(00)00417-8

Y. Kamiya, Y. Maito, T. Hirose, and K. Mizoguchi, Sorption and partial molar volume of gases in poly (dimethyl siloxane), Journal of Polymer Science Part B: Polymer Physics, vol.28, issue.8, pp.1297-1308, 1990.
DOI : 10.1002/polb.1990.090280808

T. Merkel, V. Bondar, K. Nagai, B. Freeman, and I. Pinnau, Gas sorption, diffusion, and permeation in poly(dimethylsiloxane), Journal of Polymer Science Part B: Polymer Physics, vol.10, issue.3, pp.415-434, 2000.
DOI : 10.1002/(SICI)1099-0488(20000201)38:3<415::AID-POLB8>3.0.CO;2-Z

W. Koros and H. Hopfenberg, Small Molecule Migration in Products Derived from Glassy Polymers, Industrial & Engineering Chemistry Product Research and Development, vol.18, issue.4, pp.353-358, 1979.
DOI : 10.1021/i360072a024

Y. Kamiya, Y. Naito, K. Mizoguchi, K. Terada, and J. Moreau, Thermodynamic interactions in rubbery polymer/gas systems, Journal of Polymer Science Part B: Polymer Physics, vol.35, issue.7, pp.1049-1053, 1997.
DOI : 10.1002/(SICI)1099-0488(199705)35:7<1049::AID-POLB4>3.0.CO;2-R

L. Favennec, V. Jousseaume, V. Rouessac, F. Fusalba, J. Durand et al., Porous extreme low ?? (EL??) dielectrics using a PECVD porogen approach, Materials Science in Semiconductor Processing, vol.7, issue.4-6, pp.277-282, 2004.
DOI : 10.1016/j.mssp.2004.09.084

E. Finot, S. Roualdès, M. Kirchner, V. Rouessac, R. Berjoan et al., Surface investigation of plasma HMDSO membranes post-treated by CF4/Ar plasma, Applied Surface Science, vol.187, issue.3-4, pp.326-338, 2002.
DOI : 10.1016/S0169-4332(01)01047-9
URL : https://hal.archives-ouvertes.fr/hal-00450193

E. Finot, S. Roualdes, M. Kirchner, V. Rouessac, R. Berjoan et al., Surface investigation of plasma HMDSO membranes post-treated by CF4/Ar plasma, Applied Surface Science, vol.187, issue.3-4, pp.326-338, 2002.
DOI : 10.1016/S0169-4332(01)01047-9
URL : https://hal.archives-ouvertes.fr/hal-00450193

G. Abbas, J. Mclaughlin, and E. Harkin-jones, A study of ta-C, a-C:H and Si-a:C:H thin films on polymer substrates as a gas barrier, Diamond and Related Materials, vol.13, issue.4-8, pp.1342-1345, 2004.
DOI : 10.1016/j.diamond.2003.10.084

C. Jeong, J. Lee, J. Lim, N. Cho, C. Moon et al., by Plasma Enhanced Chemical Vapor Deposition as the Diffusion Barrier to Polymer Substrates, Japanese Journal of Applied Physics, vol.44, issue.2, pp.1022-1026, 2005.
DOI : 10.1143/JJAP.44.1022

V. Rouessac, P. Ferreira, and J. Durand, Preparation of silica membranes inside macroporous alumina tubes by PECVD for hydrogen selectivity, Separation and Purification Technology, vol.32, issue.1-3, pp.37-43, 2003.
DOI : 10.1016/S1383-5866(03)00039-X
URL : https://hal.archives-ouvertes.fr/hal-00450212

A. Julbe and J. Ramsay, Fondamentals of inorganic membrane science and technology

F. Rouquerol, J. Rouquerol, and K. Sing, Adsorption by Powders & Porous Solids, 1999.

R. K. Iler, The chemistry of silica, 1979.

S. Brunauer, L. S. Dening, W. E. Dening, E. J. Teller, and J. Amer, On a Theory of the van der Waals Adsorption of Gases, Journal of the American Chemical Society, vol.62, issue.7, pp.1723-1732, 1940.
DOI : 10.1021/ja01864a025

R. Mikhail, S. Brunauer, and E. Bodor, Investigations of a complete pore structure analysis, Journal of Colloid and Interface Science, vol.26, issue.1, pp.45-53, 1968.
DOI : 10.1016/0021-9797(68)90270-1

G. Horvath and K. Kawazoe, Method for the calculation of effective pore size distribution in molecular sieve carbon., Journal of Chemical Engineering of Japan, vol.16, issue.6, pp.470-475, 1983.
DOI : 10.1252/jcej.16.470

M. Dubinin, Adsorption in micropores, Journal of Colloid and Interface Science, vol.23, issue.4, pp.487-499, 1967.
DOI : 10.1016/0021-9797(67)90195-6

B. C. Lippens and J. H. De-boer, Studies on pore systems in catalysts V. The t method, Journal of Catalysis, vol.4, issue.3, pp.319-323, 1965.
DOI : 10.1016/0021-9517(65)90307-6

J. Hagymassy-jr, S. Brunauer, R. Sh, and . Mikhail, Pore structure analysis by water vapor adsorption, Journal of Colloid and Interface Science, vol.29, issue.3, pp.485-491, 1969.
DOI : 10.1016/0021-9797(69)90132-5

H. Naono, M. Hakuman, and K. Nakai, Determination of Pore Size Distribution of Mesoporous and Macroporous Silicas by Means of Benzene-Desorption Isotherms, Journal of Colloid and Interface Science, vol.165, issue.2, pp.532-535, 1994.
DOI : 10.1006/jcis.1994.1260

M. Baklanov, K. Mogilnikov, V. Polovinkin, and F. Dultsev, Determination of pore size distribution in thin films by ellipsometric porosimetry, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.18, issue.3, pp.1385-1391, 2000.
DOI : 10.1116/1.591390

C. Wongmanerod, S. Zangooie, and H. Arwin, Determination of pore size distribution and surface area of thin porous silicon layers by spectroscopic ellipsometry, Applied Surface Science, vol.172, issue.1-2, pp.117-125, 2001.
DOI : 10.1016/S0169-4332(00)00847-3

P. Emmett, S. Brunauer, and J. Amer, The Use of Low Temperature van der Waals Adsorption Isotherms in Determining the Surface Area of Iron Synthetic Ammonia Catalysts, Journal of the American Chemical Society, vol.59, issue.8, pp.1553-1564, 1937.
DOI : 10.1021/ja01287a041

F. Bernoux, Ellipsométrie -Théorie, Techniques de l'Ingénieur, 2003.

F. Bosc, A. Ayral, P. Albouy, and C. Guizard, A Simple Route for Low-Temperature Synthesis of Mesoporous and Nanocrystalline Anatase Thin Films, Chemistry of Materials, vol.15, issue.12, pp.2463-2468, 2003.
DOI : 10.1021/cm031025a

F. Bosc, A. Ayral, P. Albouy, L. Datas, and C. Guizard, Mesostructure of Anatase Thin Films Prepared by Mesophase Templating, Chemistry of Materials, vol.16, issue.11, pp.2208-2214, 2004.
DOI : 10.1021/cm049893a

V. Rouessac, R. Coustel, F. Bosc, J. Durand, and A. Ayral, Characterisation of mesostructured TiO2 thin layers by ellipsometric porosimetry, Thin Solid Films, vol.495, issue.1-2, pp.232-236, 2006.
DOI : 10.1016/j.tsf.2005.08.334
URL : https://hal.archives-ouvertes.fr/hal-00080025

C. Boissière, D. Grosso, S. Lepoutre, L. Nicole, A. Brunet-bruneau et al., Porosity and Mechanical Properties of Mesoporous Thin Films Assessed by Environmental Ellipsometric Porosimetry, Langmuir, vol.21, issue.26, pp.12362-12371, 2005.
DOI : 10.1021/la050981z

P. Revol, D. Perret, F. Bertin, F. Fusalba, V. Rouessac et al., Porosimetry Measurements on Low Dielectric Constant???Thin Layers by Coupling Spectroscopic Ellipsometry and Solvent Adsorption-Desorption, Journal of Porous Materials, vol.70, issue.11, pp.113-121, 2005.
DOI : 10.1007/s10934-005-6768-9
URL : https://hal.archives-ouvertes.fr/hal-00077994

F. Bosc, V. Rouessac, J. Sanchez, and J. Durand, Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD, Separation and Purification Technology, vol.32, issue.1-3, pp.371-376, 2003.
DOI : 10.1016/S1383-5866(03)00061-3
URL : https://hal.archives-ouvertes.fr/hal-00450195

V. Rouessac, T. Petronel, and J. Durand, Composite plasma-polymerized organosiloxane-based material for hydrocarbon vapor selectivity, Journal of Membrane Science, vol.230, issue.1-2, pp.49-59, 2004.
DOI : 10.1016/j.memsci.2003.09.025
URL : https://hal.archives-ouvertes.fr/hal-00450228

G. Simon and F. Ferrieu, Ou autre [26] L. Favennec, thèse de l'Université Montpellier II, « Développement de matériaux diélectriques pour les interconnexions des circuits intégrés : a-SiOC, 2005.

W. Chen, K. Shull, T. Papatheodorou, D. Styrkas, and J. Keddie, Equilibrium Swelling of Hydrophilic Polyacrylates in Humid Environments, Macromolecules, vol.32, issue.1, pp.136-144, 1999.
DOI : 10.1021/ma981331n

J. Papanu, D. Hess, A. Bell, and D. Soane, In Situ Ellipsometry to Monitor Swelling and Dissolution of Thin Polymer Films, Journal of The Electrochemical Society, vol.136, issue.4, pp.1195-1200, 1989.
DOI : 10.1149/1.2096852

Y. Tang, J. Lu, A. Lewis, T. Vick, and P. Stratford, Structural Effects on Swelling of Thin Phosphorylcholine Polymer Films, Macromolecules, vol.35, issue.10, pp.3955-3964, 2002.
DOI : 10.1021/ma0117918

G. Mathe, A. Albersdörfer, K. Neumaier, and E. Sackmann, Disjoining Pressure and Swelling Dynamics of Thin Adsorbed Polymer Films under Controlled Hydration Conditions, Langmuir, vol.15, issue.25, pp.8726-8735, 1999.
DOI : 10.1021/la990658u

G. Elbs and . Krausch, Ellipsometric determination of Flory-Huggins interaction parameters in solution, Polymer, vol.45, issue.23, pp.7935-7942, 2004.
DOI : 10.1016/j.polymer.2004.09.021

X. Chu, Z. Zhao, G. Shen, and R. Yu, Quartz crystal microbalance immunoassay with dendritic amplification using colloidal gold immunocomplex, Sensors and Actuators B: Chemical, vol.114, issue.2, pp.696-704, 2006.
DOI : 10.1016/j.snb.2005.06.014

S. Sirard, P. Green, and K. Johnston, Spectroscopic Ellipsometry Investigation of the Swelling of Poly(Dimethylsiloxane) Thin Films with High Pressure Carbon Dioxide, The Journal of Physical Chemistry B, vol.105, issue.4, p.766, 2001.
DOI : 10.1021/jp002592d

H. Elbs and G. Krausch, Ellipsometric determination of Flory-Huggins interaction parameters in solution, Polymer, vol.45, issue.23, p.7935, 2004.
DOI : 10.1016/j.polymer.2004.09.021

E. Yeatman, M. Green, E. Dawnay, M. Fardad, and F. Horowitz, Characterisation of microporous sol-gel films for optical device applications, Journal of Sol-Gel Science and Technology, vol.122, issue.1-3, p.711, 1994.
DOI : 10.1007/BF00486336

D. Shamiryan, K. Weidner, W. Gray, M. Baklanov, S. Vanhaelemeersch et al., Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions, Microelectronic Engineering, vol.64, issue.1-4, p.361, 2002.
DOI : 10.1016/S0167-9317(02)00809-2

B. Lippens and J. De-boer, Studies on pore systems in catalysts V. The t method, Journal of Catalysis, vol.4, issue.3, p.319, 1965.
DOI : 10.1016/0021-9517(65)90307-6

P. H. Emmett and S. Brunauer, 1553. References 1, Mat. Res. Soc. Symp. Proc. 612, pp.5-26, 1937.

M. R. Baklanov, K. P. Mogilnikov, V. G. Polovinkin, and J. Dultsev, Determination of pore size distribution in thin films by ellipsometric porosimetry, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.18, issue.3, p.1385, 2000.
DOI : 10.1116/1.591390

E. Kondoh, M. R. Baklanov, E. Lin, D. Gidley, and A. Nakashima, Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-on-Glass Films Using Different Methods of Nondestructive Instrumentation, Japanese Journal of Applied Physics, vol.40, issue.Part 2, No. 4A, p.323, 2001.
DOI : 10.1143/JJAP.40.L323

E. M. Yeatman, M. Green, E. J. Dawnay, M. A. Fardad, and F. Horowitz, Characterisation of microporous sol-gel films for optical device applications, Journal of Sol-Gel Science and Technology, vol.122, issue.1-3, p.711, 1994.
DOI : 10.1007/BF00486336

F. Rouquerol, J. Rouquerol, and K. S. Sing, Adsorption by Powders and Porous Solids: Principles, Methodology and Applications, 1999.

M. Born and E. Wolf, Principles of Optics, 1999.
DOI : 10.1017/CBO9781139644181

B. C. Lippens and J. H. De-boer, Studies on pore systems in catalysts V. The t method, Journal of Catalysis, vol.4, issue.3, p.319, 1965.
DOI : 10.1016/0021-9517(65)90307-6

J. Hagymassy-jr, S. Brunauer, R. Sh, and . Mikhail, Pore structure analysis by water vapor adsorption, Journal of Colloid and Interface Science, vol.29, issue.3, p.485, 1969.
DOI : 10.1016/0021-9797(69)90132-5

P. A. Albouy and A. Ayral, Coupling X-ray Scattering and Nitrogen Adsorption:?? An Interesting Approach for the Characterization of Ordered Mesoporous Materials. Application to Hexagonal Silica, Chemistry of Materials, vol.14, issue.8, p.3391, 2002.
DOI : 10.1021/cm0211453

S. Inoue, Y. Hanzawa, and K. Kaneko, on Regular Mesoporous Silica, Langmuir, vol.14, issue.11, p.3079, 1998.
DOI : 10.1021/la971256u

S. Malhouitre, C. Jehoul, J. Van-aelst, H. Struyf, S. Brongersman et al., Single damascene integration of porous Zirkon??? version 1 low-k dielectric films, Microelectronic Engineering, vol.70, issue.2-4, p.302, 2003.
DOI : 10.1016/S0167-9317(03)00416-7

M. Oõneill, Air Products, p.770, 2004.

R. Vrtis, M. Oõneill, J. Vincent, L. Lukas, B. Peterson et al., Materials Technology and Reliability for Advanced Interconnects and Low-k Dielectrics Symposium, Mater. Res. Soc, pp.766-259, 2003.

R. Vrtis, Air Products, J. Appl. Phys, vol.846515, pp.95-2355, 2004.

M. Creatore, F. Palumbo, R. Agostino, and P. Fayet, RF plasma deposition of SiO 2 like films: plasma phase diagnostics and gas barrier film properties optimization, Surf. Coat. Technol, pp.142-144, 2001.

L. Agrès, Y. Ségui, R. Delsol, and P. Raynaud, Oxygen barrier efficiency of hexamethyldisiloxane/oxygen plasma-deposited coating, J. Appl. Polym. Sci, issue.11, pp.61-2015, 1996.

J. Durand and V. Rouessac, CVD techniques for gas separation membranes synthesis - characterization - applications, Le Journal de Physique IV, vol.11, issue.PR3, pp.1053-1063, 2001.
DOI : 10.1051/jp4:20013132
URL : https://hal.archives-ouvertes.fr/hal-00450190

K. Li and J. Meichsner, Gas-separating properties of membranes coated by HMDSO plasma polymer, Surface and Coatings Technology, vol.116, issue.119, pp.116-119, 1999.
DOI : 10.1016/S0257-8972(99)00269-8

J. Weichart and J. Müller, Plasma polymerization of silicon organic membranes for gas separation, Surface and Coatings Technology, vol.59, issue.1-3, pp.342-344, 1993.
DOI : 10.1016/0257-8972(93)90109-2

W. Sohn, D. Ryu, S. Oh, and J. Koo, A study on the development of composite membranes for the separation of organic vapors, Journal of Membrane Science, vol.175, issue.2, pp.175-163, 2000.
DOI : 10.1016/S0376-7388(00)00417-8

S. Roualdes, A. Van-der-lee, R. Berjoan, J. Sanchez, and J. Durand, Gas separation properties of organosilicon plasma polymerized membranes, AIChE Journal, vol.14, issue.158, pp.1566-1575, 1999.
DOI : 10.1002/aic.690450718

H. Matsuyama, A. Kariya, and M. Teramoto, Effect of siloxane chain lengths of monomers on characteristics of pervaporation membranes prepared by plasma polymerization, Journal of Applied Polymer Science, vol.51, issue.4, pp.689-693, 1994.
DOI : 10.1002/app.1994.070510414

J. Sakata, M. Yamamoto, and M. Hirai, Plasma-polymerized membranes and gas permeability, part II, J. Appl. Polym. Sci, p.31, 1986.
DOI : 10.1002/app.1987.070340807

S. Roualdes, J. Sanchez, and J. Durand, Gas diffusion and sorption properties of polysiloxane membranes prepared by PECVD, Journal of Membrane Science, vol.198, issue.2
DOI : 10.1016/S0376-7388(01)00667-6

R. Basner, R. Foest, M. Schmidt, K. Becker, and H. Deutsch, Absolute total and partial electron impact ionization cross sections of hexamethyldisiloxane, International Journal of Mass Spectrometry, vol.176, issue.3, pp.245-252, 1998.
DOI : 10.1016/S1387-3806(98)14027-7

D. Magni, C. Deschenaux, C. Hollenstein, A. Creatore, and P. Fayet, Oxygen diluted hexamethyldisiloxane plasmas investigated by means of in situ infra-red absorption spectroscopy and mass spectrometry, J. Phys. D: Appl. Phys, pp.34-87, 2001.

K. Aumaille, A. Granier, M. Schmidt, B. Grolleau, C. Vallée et al., Study of oxygen/tetraethoxysilane plasmas in a helicon reactor using optical emission spectroscopy and mass spectrometry, Plasma Sources Science and Technology, vol.9, issue.3, pp.331-339, 2000.
DOI : 10.1088/0963-0252/9/3/311

V. Rouessac, S. Roualdes, and J. Durand, In-Situ Mass Spectrometry Analyses of the Fragmentation of Linear and Cyclic Siloxanes in a Glow Discharge Compared with Ex-Situ FTIR Analyses of the Deposits, Chemical Vapor Deposition, vol.8, issue.4, pp.326-338, 2002.
DOI : 10.1002/1521-3862(20020704)8:4<155::AID-CVDE155>3.0.CO;2-R
URL : https://hal.archives-ouvertes.fr/hal-00450194

S. Eufinger, W. J. Van-ooij, and K. D. Conners, DC-Plasma Polymerization of Hexamethyldisiloxane Part II. Surface and Interface Characterization of Films Deposited on Stainless-steel Substrates, Surface and Interface Analysis, vol.209, issue.13, pp.841-855, 1996.
DOI : 10.1002/(SICI)1096-9918(199612)24:13<841::AID-SIA192>3.0.CO;2-N

V. M. Shah, B. J. Hardy, and S. A. Stern, Solubility of carbon dioxide, J. Polym. Sci. Part B: Polym. Phys, pp.31-313, 1993.

T. C. Merkel, V. I. Bondar, K. Nagai, B. D. Freeman, and I. Pinnau, Gas sorption, diffusion, and permeation in PDMS, J. Polym. Sci, pp.38-415, 2000.

F. Bosc, J. Sanchez, V. Rouessac, and J. Durand, Sorption and permeation characteristics of hybrid organosilicon thin films deposited by PECVD, Separation and Purification Technology, vol.32, issue.1-3, pp.371-376, 2003.
DOI : 10.1016/S1383-5866(03)00061-3
URL : https://hal.archives-ouvertes.fr/hal-00450195

S. Roualdes, N. Hovnanian, A. Van-der-lee, R. Berjoan, and J. Durand, Organic/inorganic thin films deposited from diethoxydimethylsilane by plasma enhanced chemical vapor deposition, Journal of Non-Crystalline Solids, vol.248, issue.2-3, p.235, 1999.
DOI : 10.1016/S0022-3093(99)00249-5

M. R. Alexander, F. R. Jones, and R. D. Short, Mass Spectral Investigation of the Radio-Frequency Plasma Deposition of Hexamethyldisiloxane, The Journal of Physical Chemistry B, vol.101, issue.18, p.3614, 1997.
DOI : 10.1021/jp970663b

C. Charles, P. Garcia, B. Golleau, and G. Turban, Mass spectrometric study of tetraethoxysilane and tetraethoxysilane???oxygen plasmas in a diode type radio???frequency reactor, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.10, issue.4, p.1407, 1992.
DOI : 10.1116/1.578258

K. Aumaille, C. Valløe, A. Granier, A. Goullet, F. Gaboriau et al., A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor, Thin Solid Films, vol.359, issue.2, p.188, 2000.
DOI : 10.1016/S0040-6090(99)00883-4

I. P. Lisovskii, V. G. Litovchenko, V. G. Lozinskii, and G. H. Steblovskii, IR spectroscopic investigation of SiO2 film structure, Thin Solid Films, vol.213, issue.2, p.164, 1992.
DOI : 10.1016/0040-6090(92)90278-J

P. G. Pai, S. S. Chao, Y. Takagi, and G. Lucovsky, films produced by plasma enhanced chemical vapor deposition, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol.4, issue.3, p.689, 1996.
DOI : 10.1116/1.573833

H. Yasuda, T. Hirotsu, and J. , Distribution of polymer deposition in plasma polymerization. II. Effect of reactor design, Journal of Polymer Science: Polymer Chemistry Edition, vol.16, issue.2, p.313, 1973.
DOI : 10.1002/pol.1978.170160201

F. D. Egitto, V. Vukanovic, and G. N. Taylor, Plasma Deposition, Treatment and Etching Polymers, p.321, 1990.

A. Bessieres, M. Meireles, R. Coratger, J. Beauvilain, and V. Sanchez, Investigations of surface properties of polymeric membranes by near field microscopy, Journal of Membrane Science, vol.109, issue.2, pp.271-284, 1996.
DOI : 10.1016/0376-7388(95)00209-X

A. M. Wrobel and M. R. Wertheimer, Plasma Deposition, Treatment and Etching of Polymers, 1990.

H. Kawakami, M. Mikawa, and S. Nagaoka, Formation of surface skin layer of asymmetric polyimide membranes and their gas transport properties, Journal of Membrane Science, vol.137, issue.1-2, p.241, 1997.
DOI : 10.1016/S0376-7388(97)00198-1

J. Clevealand, S. Manne, D. Bocek, and P. , A nondestructive method for determining the spring constant of cantilevers for scanning force microscopy, Review of Scientific Instruments, vol.64, issue.2, p.403, 1993.
DOI : 10.1063/1.1144209

J. Israelachvili, Intermolecular and Surface Forces, 1992.

V. Rouessac, G. Poullain, J. Provost, M. Gomina, and G. Desgardin, Influence of the secondary phases and post-annealing on the transport current density of sinter-forged (Bi, Pb)-2223 ceramics, The European Physical Journal Applied Physics, vol.2, issue.2, p.145, 1998.
DOI : 10.1051/epjap:1998177

Y. H. Li, J. A. Kilner, M. Dhalle, A. D. Caplin, G. Grasso et al., 'Brick wall' or 'rail switch' the role of low-angle ab-axis grain boundaries in critical current of BSCCO tapes, Superconductor Science and Technology, vol.8, issue.10, p.764, 1995.
DOI : 10.1088/0953-2048/8/10/004

V. Rouessac, J. Wang, J. Provost, and G. Desgardin, Processing and superconducting properties of highly textured Bi(Pb)-2223 ceramics by sinter-forging, Physica C: Superconductivity, vol.268, issue.3-4, p.225, 1996.
DOI : 10.1016/0921-4534(96)00423-6

W. Pachla, P. Kovac, and I. Husek, Hot pressing of Bi(Pb)-Sr-Ca-Cu-O superconducting pellets, Superconductor Science and Technology, vol.7, issue.11, p.820, 1994.
DOI : 10.1088/0953-2048/7/11/008

R. Flükiger, G. Grasso, J. C. Grivel, F. Marti, M. Dhallé et al., Phase formation and critical current density in Bi,Pb(2223) tapes, Superconductor Science and Technology, vol.10, issue.7A, p.68, 1997.
DOI : 10.1088/0953-2048/10/7A/007

F. Régi, J. Schneck, H. Savary, R. Mellet, P. Müller et al., Resistivity anisotropy and Josephson coupling in lead-substituted bismuth cuprates, Journal de Physique III, vol.4, issue.11, p.2249, 1994.
DOI : 10.1051/jp3:1994270

J. G. Noudem, J. Beille, E. Beaugnon, D. Bourgault, D. Chateignier et al., Magnetic melt texturing combined with hot pressing applied to superconducting (2223) Bi-Pb-Sr-Ca-Cu-O ceramics, Superconductor Science and Technology, vol.8, issue.7, p.558, 1995.
DOI : 10.1088/0953-2048/8/7/013

P. Yang and C. Lieber, Nanorod-Superconductor Composites: A Pathway to Materials with High Critical Current Densities, Science, vol.273, issue.5283, p.1836, 1996.
DOI : 10.1126/science.273.5283.1836