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Etude de la formation et de l'oxydation de couches
minces d'alliages Al-Ni après dépôt d'Al sur un
monocristal de Ni(111)

Abstract : This work concerns the formation and the oxidation of thin Al-Ni alloyed layers after an Al deposit on a Ni(111) single crystal under UHV conditions. The surface and bulk composition, the structure and the epitaxial relationship of the alloyed layers have been determined in situ by ion beam analysis, low energy electron diffraction and Auger electron spectroscopy, as a function of deposited Al amount and the annealing temperature. The formation of an ordered epitaxial layer of Ni3Al(111) is followed, above a critical thickness of Al (4.5 MC), by the formation of an ordered and relaxed layer of NiAl(110). The kinetics of formation of these thin alloyed layers involves complex mechanisms of diffusion and corresponds probably to a heterogeneous growth. The oxidation at 300 K followed by an annealing at 1000 K of these alloyed layers leads to the formation of a ultrathin (about 5 Å) epitaxial aluminum oxide film on Ni(111), with a stoechiometry near to Al2O3.
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https://tel.archives-ouvertes.fr/tel-00165301
Contributor : Séverine Le Pévédic <>
Submitted on : Wednesday, July 25, 2007 - 3:59:58 PM
Last modification on : Wednesday, December 9, 2020 - 3:09:34 PM
Long-term archiving on: : Friday, April 9, 2010 - 12:00:25 AM

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  • HAL Id : tel-00165301, version 1

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Séverine Le Pévédic. Etude de la formation et de l'oxydation de couches
minces d'alliages Al-Ni après dépôt d'Al sur un
monocristal de Ni(111). Matière Condensée [cond-mat]. Université Pierre et Marie Curie - Paris VI, 2007. Français. ⟨tel-00165301⟩

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