Skip to Main content Skip to Navigation
Theses

Conception, montage et caractérisation d'un interféromètre achromatique pour l'étude de la lithographie à immersion à 193nm

Abstract : Miniaturization has become the key word in microelectronics. Indeed, manufacturers aim at shrinking
device critical dimensions in order to improve their performances and to decrease their costs.
In that respect, lithography plays a predominant role since it is the step that defines the circuit.
The lithography technique used for mass production today and that addressed the 65 nm technology
node is optical lithography at a wavelength of 193 nm. But it is difficult to improve resolution
without greatly increasing complexity, tool price and difficulty in controlling the process. A solution
is immersion lithography which principle is to introduce a fluid of higher refractive index than air
between the last lens element and the wafer : it, firstly, releases the process constraints by a depthof-
focus improvement and, secondly, improves the resolution in keeping 193 nm infrastructures.
The purpose of this PhD is to create and validate a 193 nm immersion interferometric setup to
study, in advance of tool availability, some aspects of this new optical lithography technique. In this
thesis, we describe the design of an achromatic interferometric setup working in immersion at 193
nm. Such a setup has the great advantage of enabling the use of a laboratory excimer laser and
does not suffer from its poor coherence parameters. We focused on the characterization of the optical
setup and have determined parameters for depth-of-focus and transmission. Finally, we studied
imaging at high numerical apertures. We showed the benefit of immersion on resolution and the
correlation between roughness increase and contrast loss due to polarisation.
Complete list of metadatas

Cited literature [142 references]  Display  Hide  Download

https://tel.archives-ouvertes.fr/tel-00147894
Contributor : Patrick Schiavone <>
Submitted on : Monday, May 21, 2007 - 11:41:06 AM
Last modification on : Tuesday, February 16, 2021 - 3:33:53 AM
Long-term archiving on: : Thursday, April 8, 2010 - 5:13:10 PM

Identifiers

  • HAL Id : tel-00147894, version 1

Collections

Citation

Anne-Laure Charley. Conception, montage et caractérisation d'un interféromètre achromatique pour l'étude de la lithographie à immersion à 193nm. Micro et nanotechnologies/Microélectronique. Institut National Polytechnique de Grenoble - INPG, 2006. Français. ⟨tel-00147894⟩

Share

Metrics

Record views

331

Files downloads

978