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Elaboration et caractérisation structurale de films minces et revêtements de Ti2AlN.

Abstract : The objectives of this work are the synthesis of coatings and thin films of Ti2AlN (Hägg phase or 211 MAX phase). These ternary alloys combine the best properties of ceramics and metals. Three experimental approaches were used to synthesize this material. At first, we deposit TiAl/TiN multilayers by using ion-beam sputtering. After an annealing at 600°C, we evidenced the formation of (Ti,Al)N/Ti2AlN superlattices. Structural and chemical characterizations (XRD, TEM, HRTEM, EELS and XPS) have shown that the nitrogen introduced in the TiAl layers during deposition is responsible of the MAX phase formation after annealing. Aluminium atoms in excess diffuse towards the TiN Layers. In the next approach, we performed Ti2AlN coatings onto bulk or thin films TiAl alloys by high temperature plasma nitridation. We have shown that this process leads to Ti2AlN polycristalline coatings which grain size is limited by diffusion processes. At least, we performed epitaxial TiN thin films deposition onto MgO substrates by reactive cathodic magnetron sputtering. The same experimental technique was then used to search for the set of experimental parameters allowing for Ti2AlN synthesis. For the experimental set of parameters probed to date, only the cubic phases (Ti,Al)N and Ti3AlN have been observed. It seems therefore that, due to its low kinetic of growth, the windows of variations of the deposition parameters to be used for nucleation and growth of the MAX phase are quite narrow.
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Contributor : Vincent Dolique <>
Submitted on : Tuesday, May 15, 2007 - 11:14:41 AM
Last modification on : Monday, October 19, 2020 - 10:55:15 AM
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  • HAL Id : tel-00146674, version 1



Vincent Dolique. Elaboration et caractérisation structurale de films minces et revêtements de Ti2AlN.. Matière Condensée [cond-mat]. Université de Poitiers, 2007. Français. ⟨tel-00146674⟩



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