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Nouvelle filière technologique de circuits micro-ondes coplanaires à faibles pertes et à faible dispersion sur membrane composite d'oxyde et de nitrure de silicium

Abstract : This memoir treats of the elaboration and validation of a new manufacturing process for microwave circuits. Chapter I shows the advantages of coplanar-type structures and the possibility of minimizing losses and frequency dispersion by replacing the wafer with a membrane. Chapter II sets out the development of a membrane composed of silicon-oxide and -nitride. 1.4 µm - thick membranes of 5 mm x 10 mm are shown feasible with silicon chemical micro-machining ; the membranes stand up to 0.5 bar differential pressure. Chapter III presents two manufacturing processes for membrane-borne circuits : photolithography when metal thickness is less than 1 µm, and confined electro-chemical deposition when thickness is more. Both processes allow a 1 µm geometrical accuracy. Chapters IV and V deal with the design and characterization of transmission line demonstration devices. Geometrical sizing was based on a quasi static analysis and on 2.5D electromagnetic simulations. Results show losses less than 0.1 dB/mm up to 65 GHz and no frequency dispersion. Even lower losses have been reached in frequency bands L to X, with optimized metal thickness. Lastly a specific process was experimented allowing reduction of dielectric loss in contact pads on thick wafer. Chapter VI is dedicated to the technological development of a silicon micro-shield, for the electromagnetic and mechanical circuit protection. The abilities of that technology were illustrated with the implementation of a bandpass filter centered at 30 GHz. The filter insertion loss (1 dB) was shown unmodified by shielding. The manufacturing processes allow simultaneous fabrication of various circuits with a near 100% production yield. Operation of circuits has been checked between -65°C and +125°C.
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  • HAL Id : tel-00141275, version 1

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Eric Saint-Etienne. Nouvelle filière technologique de circuits micro-ondes coplanaires à faibles pertes et à faible dispersion sur membrane composite d'oxyde et de nitrure de silicium. Micro et nanotechnologies/Microélectronique. Université Paul Sabatier - Toulouse III, 1998. Français. ⟨tel-00141275⟩

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