Elaboration de nouveaux polymères photosensibles furaniques en vue de leur application sur plaques offset

Abstract : The use of the furan compounds as raw materials is largely justified by the availability and the renewable character of vegetable biomass, the source from which they are obtained. In this project, the photosensitive character of the conjugated furan compounds was exploited for the elaboration of new photo-crosslinkable polymers for their application on lithographic Offset plates. Model photosensitive compounds were first synthesized and characterized in order to simulate the synthesis and the photochemical behaviour of the corresponding photo-polymer. During the irradiation in a concentrated media, these compounds underwent a [pi2+pi2] cycloaddition between an excited and a ground state chromophore leading to the formation of cyclobutane moieties. The most interesting compounds were selected and used as monomers for the preparation of the photo-reactive polyester containing the chromophore group in the main chain. After a structural and thermal characterization, these photosensitive polymers were studied photochemically and showed a good aptitude to induce the crosslinking of the starting materials.
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Contributor : Emmanuelle Belgacem <>
Submitted on : Monday, December 6, 2004 - 10:54:00 AM
Last modification on : Friday, October 12, 2018 - 5:08:01 PM
Long-term archiving on : Friday, April 2, 2010 - 9:40:45 PM

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  • HAL Id : tel-00007623, version 1

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Elsa Tournadre-Lasseuguette. Elaboration de nouveaux polymères photosensibles furaniques en vue de leur application sur plaques offset. Matériaux. Institut National Polytechnique de Grenoble - INPG, 2004. Français. ⟨tel-00007623⟩

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