I. A. Courtney and J. R. Dahn, Key Factors Controlling the Reversibility of the Reaction of Lithium with SnO[sub 2] and Sn[sub 2]BPO[sub 6] Glass, Journal of The Electrochemical Society, vol.144, issue.9, p.2943, 1997.
DOI : 10.1149/1.1837941

Y. Piffard, F. Leroux, D. Guyomard, J. L. Mansot, and M. Tournoux, The amorphous oxides MnV2O6 + ?? (0 < ?? < 1) as high capacity negative electrode materials for lithium batteries, Journal of Power Sources, vol.68, issue.2, p.698, 1997.
DOI : 10.1016/S0378-7753(96)02576-1

]. S. Denis, E. Baudrin, M. Touboul, and J. M. Tarascon, Synthesis and Electrochemical Properties of Amorphous Vanadates of General Formula RVO[sub 4] (R = In, Cr, Fe, Al, Y) vs. Li, Journal of The Electrochemical Society, vol.144, issue.12, p.4099, 1997.
DOI : 10.1149/1.1838150

M. Mohamedi, M. Makino, K. Dokko, T. Itoh, and I. Uchida, Electrochemical investigation of LiNi0.5Mn1.5O4 thin film intercalation electrodes, Electrochimica Acta, vol.48, issue.1, p.79, 2002.
DOI : 10.1016/S0013-4686(02)00554-6

]. K. Wasa and S. Hayakawa, Handbook of sputter deposition technology; principles, technology and applications, Thin Solid Films, vol.247, issue.201, 1992.

I. Bibliographie-du-chapitre, J. W. Chu, M. Mayer, . R. Nicolet-]-l, and . Doolittle, Backscattering Spectrometry, Lieb, p.36, 1955.

]. K. Wasa and S. Hayakawa, Handbook of sputter deposition technology; principles, technology and applications, 1992.

T. J. Vink, R. G. Verbeek, J. H. Snijders, and Y. Tamminga, Physically trapped oxygen in sputter-deposited MoO3 films, Journal of Applied Physics, vol.87, issue.10, p.7252, 2000.
DOI : 10.1063/1.372976

E. Caudron, G. Baud, J. P. Besse, G. Blondiaux, and M. Jacquet, Elaboration, characterization and electrical properties of Na???Al???O thin films, Materials Science and Engineering: B, vol.26, issue.2-3, p.181, 1994.
DOI : 10.1016/0921-5107(94)90169-4

S. Lee, H. Lee, T. Ha, H. Baik, and S. Lee, Amorphous Lithium Nickel Vanadate Thin-Film Anodes for Rechargeable Lithium Microbatteries, Electrochemical and Solid-State Letters, vol.5, issue.6, p.138, 2002.
DOI : 10.1149/1.1477298

]. I. Hotovy, D. Buc, S. Hascik, and O. Nennewitz, Characterization of NiO thin films deposited by reactive sputtering, Vacuum, vol.50, issue.1-2, p.41, 1998.
DOI : 10.1016/S0042-207X(98)00011-6

M. Lu, W. S. Hwang, J. S. Yang, and H. C. Chuang, Thin Solid Films, Nachr. Ges. Wiss. Göttingen, Math.-Phys. Klasse Z. Kristallogr, vol.82, pp.420-421, 1918.

G. Ceder, M. K. Aydinol, and A. F. Kohan, Application of first-principles calculations to the design of rechargeable Li-batteries, Computational Materials Science, vol.8, issue.1-2, p.161, 1997.
DOI : 10.1016/S0927-0256(97)00029-3

M. Dollé, P. Poizot, L. Dupont, and J. M. Tarascon, Experimental Evidence for Electrolyte Involvement in the Reversible Reactivity of CoO toward Compounds at Low Potential, Electrochemical and Solid-State Letters, vol.5, issue.1, p.18, 2002.
DOI : 10.1149/1.1425262