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Développement de la microscopie interférométrique pour une meilleure analyse morphologique des couches minces et épaisses des matériaux semiconducteurs et optiques

Abstract : Interference microscopy techniques, based on the principle of optical interference, have gone through considerable development during the last few years. Two families of techniques can be distinguished : Phase Stepping Microscopy (PSM), which is well adapted for the analysis of nanometric surface roughness, and Coherence Probe Microscopy (CPM) for the measurement of deeper micronic surface relief. The aim of this work is to improve the performance of the interference microscopy system, in terms of its precision, resolution, automatic control and use in the characterization of thin and thick layers used in microelectronics and optics. In particular, new algorithms for controlling the system and for processing and analysing the data have been developed to facilitate the characterization of layers, and to correct certain errors in the PSM and CPM measurements. To better understand the performances and limits of the system, some comparative studies were carried out between PSM and CPM measurements and those made with other techniques (stylus, SEM, AFM, and confocal microscopy) through three applications. We have shown in the first application that PSM could be used for the quantitative optimisation of the laser annealing process of poly-Si layers for flat panel displays in a flexible, non-destructive and faster manner than by using classical methods. In the second application, we have shown that the use of CPM could contribute to a new method of rapid prototyping of Diffractive Optical Elements (DOEs) due to its rapidity, precision, and ability to correctly profile thick transparent layers. In the third and last application, a new non-destructive interference technique has been developed for characterizing interfaces buried under a transparent layer.
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https://tel.archives-ouvertes.fr/tel-00002418
Contributor : Abderrazzaq Benatmane <>
Submitted on : Tuesday, February 18, 2003 - 1:12:41 PM
Last modification on : Thursday, April 23, 2020 - 2:26:30 PM
Long-term archiving on: : Wednesday, November 23, 2016 - 3:24:15 PM

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Abderrazzaq Benatmane. Développement de la microscopie interférométrique pour une meilleure analyse morphologique des couches minces et épaisses des matériaux semiconducteurs et optiques. Autre. Université Louis Pasteur - Strasbourg I, 2002. Français. ⟨tel-00002418⟩

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