Detailed view

Conference proceedings

(2002)

Access to microsystem technology: the CMP services solution

B. Charlot1, B. Courtois1, H. Delori1, J.F. Paillotin1, K. Torki1

CMP aims at providing Universities, Research Laboratories and Industries with the possibility to have their integrated circuits projects fabricated for prototyping and low volume production. Presently, users are serviced for CMOS double layer poly/double layer metal (DLP/DLM) 0.8 mu , DLM/TLM 0.6 mu , DLP/4LM 0.35 mu , SLP/6LM 0.18 mu and 0.12 mu , BiCMOS DLP/DLM 0.8 mu , SiGe BiCMOS DLP/DLM 0.8 mu and 5 LM 0.35 mu , and HEMT GaAs 0.2 mu . About 40 multi-project runs are offered per year. Micro Electro Mechanical Systems (MEMS) are provided in standard CMP runs in CMOS DLP/DLM 0.8 mu m and DLM/TLM 0.6 mu , BiCMOS DLP/DLM 0.8 mu and HEMT GaAs 0.2 mu , using compatible front-side bulk micro-machining. MUMPS process is offered as a surface micro-machining allowing one to integrate MEMS only microstructures. This paper describes the services available, focusing on the most advanced IC processes and on the MEMS processes.

1:	TIMA - Techniques of Informatics and Microelectronics for integrated systems Architecture

Keyword(s) : microsystem-technology – integrated-circuits-projects – prototyping- – low-volume-production – CMOS- – double-layer-poly-double-layer-metal – DLM-TLM – DLP-DLM – SLP-6LM – BiCMOS- – SiGe- – 5LM- – HEMT- – multi-project-runs – MEMS- – front-side-bulk-micro-machining – MUMPS- – surface-micro-machining – CMP-services – 0.8-micron – 0.6-micron – 0.35-micron – 0.18-micron – 0.12-micron – 0.2-micron – GaAs-

hal-00007832, version 1

http://hal.archives-ouvertes.fr/hal-00007832

oai:hal.archives-ouvertes.fr:hal-00007832

From: Lucie Torella <>

Submitted on: Tuesday, 9 August 2005 09:00:46

Updated on: Tuesday, 9 August 2005 09:00:46