Loading...
Derniers dépôts
-
Sayed Albahrani, David Philippon, Philippe Vergne, Jean-Marie Bluet. A review of in situ methodologies for investigating EHD contacts. Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology, 2015, 230 (1), pp.86-110. ⟨10.1177/1350650115590428⟩. ⟨hal-01249328⟩
-
Kévin Vilayphone, Mohamed Amara, Regis Orobtchouk, Fabien Mandorlo, Serge Mazauric, et al.. Design Rules for Structural Colors in All-Dielectric Metasurfaces: From Individual Resonators to Collective Resonances and Color Multiplexing. ACS photonics, 2024, 11 (2), pp.470-483. ⟨10.1021/acsphotonics.3c01300⟩. ⟨hal-04589113⟩
-
Mohammad Hasan Ahmadilivani, Alberto Bosio, Bastien Deveautour, Fernando Fernandes dos Santos, Juan David Guerrero Balaguera, et al.. Special Session: Reliability Assessment Recipes for DNN Accelerators. VTS 2024 - IEEE VLSI Test Symposium, Apr 2024, Tempe AZ USA, United States. pp.131788 - 131828, ⟨10.1109/access.2022.3229767⟩. ⟨hal-04572731⟩
-
Martina Zanetti, Alexandre Danescu, Jean-Louis Leclercq, Philippe Regregny, Maxime Darnon, et al.. Low-temperature joining of semiconductor substrates and thin layers on solid and flexible wafers by solid-liquid inter-diffusion bonding using a low-thickness Ni-Sn system. DTIP Malta 2023, May 2023, La Valletta, Malta. ⟨10.1109/DTIP58682.2023.10267939⟩. ⟨hal-04566973⟩
-
Vincent Célibert, Bassem Salem, Gérard Guillot, Catherine Bru-Chevallier, Laurent Grenouillet, et al.. Growth and characterization of InAs quantum dots on GaAs (100) emitting at 1.31μm. MRS Online Proceedings Library, 2003, Materials Research Society Symposium - Proceedings, 794, pp. 207-212. ⟨10.1557/PROC-799-Z7.8/T7.8⟩. ⟨hal-02353320⟩
-
Olimpia Tammaro, Rosanna Paparo, Marica Chianese, Ida Ritacco, Bruno Masenelli, et al.. Reverse micelle strategy for effective substitutional Fe-doping in small-sized CeO2 nanocrystals: Assessment of adsorption and photodegradation efficiency of ibuprofen under visible light. Chemical Engineering Journal, 2024, 479, pp.147909. ⟨10.1016/j.cej.2023.147909⟩. ⟨hal-04341977⟩